Multi-charged particle beam writing method, and multi-charged particle beam writing apparatus

A multi-charged particle beam writing apparatus comprising:

• an emission source configured to emit multiple charged particle beams;
• an acquisition circuit configured to acquire a beam array shape of the multiple charged particle beams;
• a magnification correction amount calculation circuit configured to calculate a magnification correction amount of an acquired beam array shape by using a first coefficient indicating a displacement component which deviates in a first direction in proportion to a design coordinate in the first direction of the acquired beam array shape, where the first direction is parallel to a direction of writing performed while continuously moving a stage with a target object thereon;
• a rotation correction amount calculation circuit configured to calculate a rotation correction amount of the acquired beam array shape by using a second coefficient indicating a displacement component which deviates in a second direction, being orthogonal to the first direction, in proportion to a design coordinate in the first direction of the acquired beam array shape;
• a modulation dose amount calculation circuit configured to calculate a modulation dose amount for each unit region of a plurality of unit regions obtained by dividing a stripe region of the target object into mesh regions, based on at least one of a third coefficient indicating a displacement component which deviates in the first direction in proportion to a design coordinate in the second direction of the acquired beam array shape, and a fourth coefficient indicating a displacement component which deviates in the second direction in proportion to a design coordinate in the second direction of the acquired beam array shape;
• a dose modulation circuit configured to perform modulation of a dose amount for the each unit region by using the modulation dose amount;
• an objective lens configured to perform at least one of magnification correction, corresponding to the magnification correction amount, of the acquired beam array shape, and rotation correction, corresponding to the rotation correction amount, of the acquired beam array shape;
• and
• a writing mechanism configured to write a pattern on the target object with the multiple charged particle beams for which the modulation of the dose amount and at least the one of the magnification correction of the acquired beam array shape and the rotation correction of the acquired beam array shape have been performed.