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US 2026/0213127 A1Published application
Evaluation pattern formation method and position variation evaluation method
AssigneeNuFlare Technology, Inc.
InventorsShunsuke ISAJI, Satoru HIROSE
Life of this patent
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Abstract
In one embodiment, an evaluation pattern formation method includes a step of irradiating a charged particle beam onto a sample to write a plurality of first patterns having different pattern densities, and a step of writing a plurality of second patterns having different pattern densities so that, when combined with at least some of the plurality of first patterns, each pattern achieves the same pattern density, thereby forming a plurality of evaluation patterns with the same pattern density.
Claims6
An evaluation pattern formation method comprising:
- a step of irradiating a charged particle beam onto a sample to write a plurality of first patterns having different pattern densities;
- and
- a step of writing a plurality of second patterns having different pattern densities so that, when combined with at least some of the plurality of first patterns, each pattern achieves the same pattern density, thereby forming a plurality of evaluation patterns with the same pattern density.
Dependencies are inferred from the claim text.