High yield reticle with proximity effect halos
AssigneeSynopsys, Inc.
InventorChristophe Pierrat
Life of this patent
Estimating the term…
Abstract
A lithography reticle advantageously includes “proximity effect halos” around tight tolerance features. During reticle formation, the tight tolerance features and associated halos can be carefully written and inspected to ensure accuracy while the other portions of the reticle can be written/inspected less stringently for efficiency. A system for creating a reticle data file from an IC layout data file can include a processing module and a graphical display. The processing module can read the IC layout data file, identify critical features and define a halo region around each of the critical features. The graphical user interface can facilitate user input and control. The system can be coupled to a remote IC layout database through a LAN or a WAN.
Claims30
A reticle for transferring an integrated circuit layout to a wafer, the reticle comprising:
- at least one layout feature having an area designated a tight tolerance feature and an area designated as a proximity effect halo, wherein the areas designated as a tight tolerance feature and as a proximity effect halo were subjected to a write, test, or repair process having a tighter tolerance than other areas on the reticle.
A reticle for transferring an integrated circuit layout to a wafer, the reticle comprising:
- a first set of layout features having a first tolerance;
- a second set of layout features being within a proximity effect halo of the first set of layout features, the second set of layout features having the first tolerance;
- and
- a third set of layout features being outside the proximity effect halo of the first set of layout features, the third set of layout features having a second tolerance, wherein the second tolerance is less tight than the first tolerance.
A reticle for transferring an integrated circuit layout to a wafer, the reticle comprising:
- a first layout feature having a first tolerance;
- a second layout feature being within a proximity effect halo of the first layout feature, the second layout feature having the first tolerance;
- and
- a third layout feature being outside the proximity effect halo of the first layout feature, the third feature having a second tolerance, wherein the second tolerance is less tight than the first tolerance.
A system for creating a reticle data file from an integrated circuit (IC) layout data file, the system comprising:
- a processing module, the processing module being configured to read the IC layout data file, identify a plurality of specified layout features in the IC layout data file, and define a halo region having a substantially constant width around each of the plurality of specified layout features, wherein the areas designated as a tight tolerance feature and as a proximity effect halo will be subject to a writing, inspection, or repair process having a tighter tolerance than other areas on the reticle;
- and
- a graphical display, the graphical display being configured to provide a graphical user interface (GUI) to allow user input and control of the processing module.
Dependencies are inferred from the claim text.