H01J 2237/31752
Using particular beams or near-field effects
Official title: using particular beams or near-field effects, e.g. STM-like techniques
H01J2237/31752 (Using particular beams or near-field effects) appears on 172 US grants and 151 published applications in this corpus.
Search patents in H01J- Granted patents
- 172
- Published applications
- 151
- Assignees
- 100
- Inventors
- 359
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 5 | 1 |
| 2002 | 2 | 4 |
| 2003 | 4 | 10 |
| 2004 | 5 | 7 |
| 2005 | 7 | 7 |
| 2006 | 9 | 8 |
| 2007 | 6 | 21 |
| 2008 | 5 | 2 |
| 2009 | 16 | 4 |
| 2010 | 3 | 2 |
| 2011 | 3 | 2 |
| 2012 | 6 | 7 |
| 2013 | 3 | 7 |
| 2014 | 9 | 8 |
| 2015 | 6 | 12 |
| 2016 | 11 | 7 |
| 2017 | 11 | 7 |
| 2018 | 6 | 8 |
| 2019 | 5 | 5 |
| 2020 | 6 | 10 |
| 2021 | 6 | 3 |
| 2022 | 5 | 2 |
| 2023 | 5 | 3 |
| 2024 | 3 | 2 |
| 2025 | 0 | 2 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Multi-beam pattern definition device28 Apr 2026US 12,614,695 B2IMS Nanofabrication GmbH
- Area selective deposition templated by hydrogen and halogen resists6 Jan 2026US 12,518,967 B1National Technology & Engineering Solutions of Sandia, LLC
- Beam pattern device having beam absorber structure26 Nov 2024US 12,154,756 B2IMS Nanofabrication GmbH
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method10 Sep 2024US 12,087,543 B2NuFlare Technology, Inc.
- Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system28 May 2024US 11,996,267 B2ASML Netherlands B. V.
- Charged particle beam writing apparatus, charged particle beam writing method, and non-transitory computer-readable storage medium storing program13 Nov 2025US 2025/0349506 A1NuFlare Technology, Inc.
- Electron beam processing methods30 Oct 2025US 2025/0336643 A1Multibeam Corporation
- Mark position measurement apparatus, charged particle beam writing apparatus, and mark position measurement method31 Oct 2024US 2024/0363307 A1NuFlare Technology, Inc.
- Ion beam lithography and nanoengineering4 Jul 2024US 2024/0222073 A1Intel Corporation
- Multi-Beam Pattern Definition Device9 Nov 2023US 2023/0360880 A1IMS Nanofabrication GmbH
Most cited
By later US patents
- Semiconductor device and a manufacturing method of the same111US 6,709,880 B2Hitachi, Ltd. · 2004
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Method and apparatus for writing or etching narrow linewidth patterns on insulating materials87US 5,047,649 AInternational Business Machines Corporation · 1991
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Ion sources, systems and methods67US 7,554,097 B2ALIS Corporation · 2009