H01J 2237/31755
Using ion beams
Official title: using ion beams
H01J2237/31755 (Using ion beams) appears on 54 US grants and 39 published applications in this corpus.
Search patents in H01J- Granted patents
- 54
- Published applications
- 39
- Assignees
- 32
- Inventors
- 104
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 2 |
| 2004 | 0 | 4 |
| 2005 | 3 | 1 |
| 2006 | 2 | 2 |
| 2007 | 0 | 15 |
| 2008 | 2 | 1 |
| 2009 | 14 | 2 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 2 | 1 |
| 2013 | 2 | 0 |
| 2014 | 1 | 1 |
| 2015 | 1 | 2 |
| 2016 | 2 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 1 |
| 2019 | 0 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 2 |
| 2022 | 1 | 0 |
| 2023 | 0 | 2 |
| 2024 | 2 | 1 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multi-beam pattern definition device28 Apr 2026US 12,614,695 B2IMS Nanofabrication GmbH
- Beam pattern device having beam absorber structure26 Nov 2024US 12,154,756 B2IMS Nanofabrication GmbH
- Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system28 May 2024US 11,996,267 B2ASML Netherlands B. V.
- Ion beam lithography method based on ion beam lithography system27 Dec 2022US 11,538,653 B2Beijing Normal University
- Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus26 May 2020US 10,662,059 B2Hitachi, Ltd.
- Ion beam lithography and nanoengineering4 Jul 2024US 2024/0222073 A1Intel Corporation
- Multi-Beam Pattern Definition Device9 Nov 2023US 2023/0360880 A1IMS Nanofabrication GmbH
- Beam Pattern Device Having Beam Absorber Structure16 Feb 2023US 2023/0052445 A1IMS Nanofabrication GmbH
- Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system21 Oct 2021US 2021/0327678 A1ASML Netherlands B. V.
- Ion beam lithography method based on ion beam lithography system17 Jun 2021US 2021/0183616 A1Beijing Normal University
Most cited
By later US patents
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Ion sources, systems and methods67US 7,554,097 B2ALIS Corporation · 2009
- Ion sources, systems and methods65US 7,557,359 B2ALIS Corporation · 2009
- Ion sources, systems and methods64US 7,557,358 B2ALIS Corporation · 2009