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AssigneeASML Netherlands B.V.
InventorsRuben Cornelis MAAS, Alexey Olegovich POLYAKOV, Teis Johan COENEN
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A particle beam apparatus includes an object table configured to hold a semiconductor substrate; a particle beam source configured to generate a particle beam; a detector configured to detect a response of the substrate caused by interaction of the particle beam with the substrate and to output a detector signal representative of the response; and a processing unit configured to: receive or determine a location of one or more defect target areas on the substrate; control the particle beam source to inspect the one or more defect target areas; identify one or more defects within the one or more defect target areas, based on the detector signal obtained during the inspection of the one or more defect target areas; control the particle beam source to repair the one or more defects.
A particle beam apparatus comprising:
A defect repair method comprising:
The method according to claim 15, wherein the inspecting the one or more defect target areas comprises scanning the one or more defect target areas with a particle beam, and/or wherein the modifying the patterned resist layer at the one or more defects comprises exposing the one or more defects to a particle beam.
A computer product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
Dependencies are inferred from the claim text.