H01J 2237/31754
Using electron beams
Official title: using electron beams
H01J2237/31754 (Using electron beams) appears on 82 US grants and 88 published applications in this corpus.
Search patents in H01J- Granted patents
- 82
- Published applications
- 88
- Assignees
- 52
- Inventors
- 174
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 2 |
| 2004 | 1 | 2 |
| 2005 | 1 | 5 |
| 2006 | 5 | 4 |
| 2007 | 5 | 4 |
| 2008 | 3 | 1 |
| 2009 | 0 | 1 |
| 2010 | 2 | 1 |
| 2011 | 1 | 1 |
| 2012 | 2 | 5 |
| 2013 | 1 | 7 |
| 2014 | 6 | 7 |
| 2015 | 4 | 9 |
| 2016 | 9 | 6 |
| 2017 | 9 | 6 |
| 2018 | 4 | 5 |
| 2019 | 5 | 4 |
| 2020 | 3 | 8 |
| 2021 | 5 | 1 |
| 2022 | 4 | 2 |
| 2023 | 4 | 3 |
| 2024 | 2 | 1 |
| 2025 | 0 | 2 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multi-beam pattern definition device28 Apr 2026US 12,614,695 B2IMS Nanofabrication GmbH
- Area selective deposition templated by hydrogen and halogen resists6 Jan 2026US 12,518,967 B1National Technology & Engineering Solutions of Sandia, LLC
- Beam pattern device having beam absorber structure26 Nov 2024US 12,154,756 B2IMS Nanofabrication GmbH
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method10 Sep 2024US 12,087,543 B2NuFlare Technology, Inc.
- Proximity effect correcting method, master plate manufacturing method, and drawing apparatus29 Aug 2023US 11,742,179 B2Kioxia Corporation
- Charged particle beam writing apparatus, charged particle beam writing method, and non-transitory computer-readable storage medium storing program13 Nov 2025US 2025/0349506 A1NuFlare Technology, Inc.
- Electron beam processing methods30 Oct 2025US 2025/0336643 A1Multibeam Corporation
- Mark position measurement apparatus, charged particle beam writing apparatus, and mark position measurement method31 Oct 2024US 2024/0363307 A1NuFlare Technology, Inc.
- Multi-Beam Pattern Definition Device9 Nov 2023US 2023/0360880 A1IMS Nanofabrication GmbH
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method23 Feb 2023US 2023/0056463 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Method for charged-particle multi-beam exposure33US 9,053,906 B2IMS Nanofabrication GmbH · 2015
- Bias correction for lithography25US 10,444,629 B2D2S, Inc. · 2019
- Electron beam lithography method using new material18US 7,144,680 B2Samsung Electronics Co., Ltd. · 2006
- Electron beam direct writing system for ULSI lithography with facilitated rotation and gain corrections of shot patterns and electron beam direct writing method for same14US 5,438,207 ANEC Corporation · 1995
- Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device13US 7,202,488 B2Kabushiki Kaisha Toshiba · 2007