Electron beam processing methods
AssigneeMultibeam Corporation
InventorsAndrew Ceballos, Ted Prescop, Eli Vronsky, Justin Fortner
Life of this patent
Estimating the term…
Abstract
A method for electron beam processing is described herein. A method includes disposing a substrate on a stage of a processing tool comprising a plurality of independently powered, independently controlled modular electron beam devices, concurrently directing a plurality of electron beams from the plurality of electron beam devices to the substrate to process different areas of the substrate concurrently, and, while directing the electron beams to the substrate, moving the substrate at a first constant velocity during a first scan pass and at a second constant velocity during a second scan pass, the first constant velocity being different from the second constant velocity.
Claims20
A method, comprising:
- disposing a substrate on a stage of a processing tool comprising a plurality of independently powered, independently controlled modular electron beam devices;
- concurrently directing a plurality of electron beams from the plurality of electron beam devices to the substrate to process different areas of the substrate concurrently;
- and
- while directing the electron beams to the substrate, moving the substrate at a first constant velocity during a first scan pass and at a second constant velocity during a second scan pass, the first constant velocity being different from the second constant velocity.
A method, comprising:
- disposing a substrate on a stage of a processing tool comprising a plurality of independently powered, independently controlled electron beam devices;
- selecting a power for each electron beam device based on a plan for writing features on the substrate;
- and
- concurrently directing a plurality of electron beams from the plurality of electron beam devices, at each respective selected power, to the substrate to process different areas of the substrate concurrently.
A method, comprising:
- disposing a substrate on a stage of a processing tool comprising a plurality of independently powered, independently controlled electron beam devices;
- concurrently and continuously directing a plurality of electron beams from the plurality of electron beam devices to the substrate to process different areas of the substrate concurrently;
- and
- moving each electron beam of the plurality of electron beams at a first speed in a first area of the substrate and a second speed in a second area of the substrate, wherein the first speed is selected to deliver an exposure dose to the first area and the second speed is selected to deliver a non-exposure dose to the second area.
Dependencies are inferred from the claim text.