H01J 2237/31769
Proximity effect correction
H01J2237/31769 (Proximity effect correction) appears on 274 US grants and 216 published applications in this corpus.
Search patents in H01J- Granted patents
- 274
- Published applications
- 216
- Assignees
- 71
- Inventors
- 363
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 4 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 4 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 9 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 6 | 0 |
| 1998 | 7 | 0 |
| 1999 | 6 | 0 |
| 2000 | 7 | 0 |
| 2001 | 5 | 2 |
| 2002 | 6 | 5 |
| 2003 | 14 | 11 |
| 2004 | 9 | 5 |
| 2005 | 8 | 10 |
| 2006 | 5 | 9 |
| 2007 | 5 | 7 |
| 2008 | 5 | 1 |
| 2009 | 10 | 3 |
| 2010 | 4 | 4 |
| 2011 | 2 | 4 |
| 2012 | 5 | 16 |
| 2013 | 12 | 14 |
| 2014 | 8 | 17 |
| 2015 | 16 | 14 |
| 2016 | 12 | 12 |
| 2017 | 12 | 17 |
| 2018 | 12 | 12 |
| 2019 | 17 | 11 |
| 2020 | 9 | 14 |
| 2021 | 10 | 6 |
| 2022 | 4 | 1 |
| 2023 | 7 | 9 |
| 2024 | 5 | 2 |
| 2025 | 3 | 4 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Shape-based proximity effect correction method for throughput, patterning fidelity, and contrast enhancement of particle beam lithography and imaging structure7 Apr 2026US 12,597,585 B2National Taipei University
- Proximity effect correction in electron beam lithography24 Feb 2026US 12,560,870 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium28 Oct 2025US 12,456,601 B2NuFlare Technology, Inc.
- Method and system for determining a charged particle beam exposure for a local pattern density4 Mar 2025US 12,243,712 B2D2S, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Proximity effect correction in electron beam lithography11 Jun 2026US 2026/0161099 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Multiple charged-particle beam irradiation apparatus, multiple charged-particle beam irradiation method, correction map generation apparatus, and correction map generation method28 May 2026US 2026/0148927 A1NuFlare Technology, Inc.
- Raster beam writing method and raster beam writing apparatus12 Mar 2026US 2026/0074144 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Optical proximity correction method and apparatus293US 6,269,472 B1LSI Logic Corporation · 2001
- High yield reticle with proximity effect halos210US 6,968,527 B2Synopsys, Inc. · 2005
- Method for generating proximity correction features for a lithographic mask pattern161US 5,663,893 AMicroUnity Systems Engineering, Inc. · 1997
- Method and apparatus for run-time correction of proximity effects in pattern generation125US 5,847,959 AEtec Systems, Inc. · 1998
- Proximity correction method for E-beam lithography72US 5,241,185 AInternational Business Machines Corporation · 1993