US 2026/0148927 A1Published application

Multiple charged-particle beam irradiation apparatus, multiple charged-particle beam irradiation method, correction map generation apparatus, and correction map generation method

AssigneeNuFlare Technology, Inc.

InventorsYuji FUJIWARA, Yasuo KATO, Hiroshi MATSUMOTO

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Abstract

In one embodiment, a multiple charged-particle beam irradiation apparatus includes a correction map generation unit calculating, for each pixel, a beam modulation rate for the pixel and a beam modulation rate for at least one of pixels surrounding the pixel, based on an amount of displacement of a beam emitted toward the pixel and a position of a pattern placed within the pixel and generating a correction map in which modulation rates are defined, and an irradiation dose correction unit calculating, for each pixel, a corrected irradiation dose by adding a value obtained by multiplying the beam modulation rate for the pixel defined in the correction map by the beam irradiation dose for the pixel and a value obtained by multiplying the beam modulation rate for the at least one pixel by a beam irradiation dose for a pixel serving as an associated destination of the at least one pixel.

A multiple charged-particle beam irradiation apparatus comprising:

a correction map generation unit that calculates, for each pixel serving as an irradiation unit region per beam of multiple charge-particle beams, a beam modulation rate for the pixel and a beam modulation rate for at least one of pixels surrounding the pixel, based on an amount of displacement of a beam emitted toward the pixel and a position of a pattern placed within the pixel to correct, by modulating a beam irradiation dose for the pixel and a beam irradiation dose for the at least one of the pixels surrounding the pixel, a displacement of a pattern formed by a beam that is emitted toward the pixel but displaced, and generates a correction map in which modulation rates are defined for an irradiation region to be irradiated with multiple charge-particle beams such that the calculated beam modulation rate for the pixel is defined at a position of the pixel, and the beam modulation rate for the at least one of the pixels surrounding the pixel is associated with the pixel and defined at a position of the at least one of the pixels surrounding the pixel;
a shot data generation unit that calculates, for each pixel, a beam irradiation dose for the pixel;
an irradiation dose correction unit that calculates, for each pixel, a corrected irradiation dose by adding a value obtained by multiplying the beam modulation rate for the pixel defined in the correction map by the beam irradiation dose for the pixel and a value obtained by multiplying the beam modulation rate for the at least one pixel, which is defined at the position of the pixel as the at least one of the surrounding pixels in the correction map, by a beam irradiation dose for a pixel serving as an associated destination of the at least one pixel;
and
an irradiation unit that irradiates a sample surface with multiple charged-particle beams such that corresponding pixels are irradiated with beams with the corrected irradiation doses in a respective manner.

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Facts

Application

19/352,569Filed 8 Oct 2025

Priority

JP 2024-20563426 Nov 2024

Published

28 May 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification11 codes

H01J 37/243
Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for: beam current control or regulation circuits
H01J 37/3177
Particle-beam lithography, e.g. electron beam lithography: multi-beam, e.g. fly's eye, comb probe
H01J 37/22
Details: optical , image processing or photographic arrangements associated with the tube
H01J 37/3026
Program control: patterning strategy

Abstract

Claims10