Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium

A charged particle beam writing apparatus in which a charged particle beam is deflected by a deflector, and a pattern is written by irradiating, with the charged particle beam, a substrate having a resist film formed thereon, the charged particle beam writing apparatus comprising:

• an emission unit emitting the charged particle beam;
• a storage storing charge amount information representing a relationship between a first dose for the charged particle beam for a pattern region, which is a region where a pattern based on writing data is to be formed, and a pattern density of the pattern region, and a charge amount of the resist film;
• a non-dissolution dose calculator referencing the charge amount information and calculating a second dose for a case where a non-pattern region is irradiated with the charged particle beam based on the first dose and the charge amount of the resist film obtained from the pattern density of the pattern region, the non-pattern region being a region where a pattern is not to be formed, such that the resist film is not dissolved away, and a charge amount difference between the pattern region and a non-dissolution irradiation region, which is irradiated at the second dose, is smaller than that obtained when the second dose is zero;
• and
• a writer irradiating the pattern region with the charged particle beam at the first dose and irradiating the non-pattern region with the charged particle beam at the second dose.