H01J 2237/31777
By projection
Official title: by projection
H01J2237/31777 (By projection) appears on 253 US grants and 139 published applications in this corpus.
Search patents in H01J- Granted patents
- 253
- Published applications
- 139
- Assignees
- 94
- Inventors
- 363
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 5 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 5 | 0 |
| 1988 | 3 | 0 |
| 1989 | 1 | 0 |
| 1990 | 6 | 0 |
| 1991 | 3 | 0 |
| 1992 | 5 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 5 | 0 |
| 1996 | 7 | 0 |
| 1997 | 5 | 0 |
| 1998 | 7 | 0 |
| 1999 | 12 | 0 |
| 2000 | 3 | 0 |
| 2001 | 7 | 4 |
| 2002 | 17 | 10 |
| 2003 | 9 | 11 |
| 2004 | 12 | 21 |
| 2005 | 16 | 16 |
| 2006 | 13 | 6 |
| 2007 | 8 | 10 |
| 2008 | 6 | 3 |
| 2009 | 3 | 6 |
| 2010 | 13 | 3 |
| 2011 | 3 | 3 |
| 2012 | 7 | 3 |
| 2013 | 3 | 2 |
| 2014 | 1 | 7 |
| 2015 | 6 | 9 |
| 2016 | 10 | 6 |
| 2017 | 11 | 0 |
| 2018 | 5 | 3 |
| 2019 | 0 | 5 |
| 2020 | 5 | 4 |
| 2021 | 4 | 4 |
| 2022 | 2 | 2 |
| 2023 | 3 | 0 |
| 2024 | 1 | 1 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Optimizing image distortion in a multi beam charged particle processing apparatus28 Jul 2026US 12,695,055 B2IMS Nanofabrication GmbH
- Pattern formation method and template manufacturing method2 Jan 2024US 11,862,430 B2Kioxia Corporation
- Focused ion beam processing apparatus8 Aug 2023US 11,721,517 B2Hitachi High-Tech Science Corporation
- Multiple electron beam writing apparatus and multiple electron beam writing method4 Apr 2023US 11,621,140 B2NuFlare Technology, Inc.
- Charged particle beam lithography system21 Mar 2023US 11,610,758 B2Kkt Holdings Syndicate
- Optimizing Image Distortion in a Multi Beam Charged Particle Processing Apparatus12 Sep 2024US 2024/0304413 A1IMS Nanofabrication GmbH
- Multiple electron beam writing apparatus and multiple electron beam writing method24 Feb 2022US 2022/0059310 A1NuFlare Technology, Inc.
- Pattern formation method and template manufacturing method17 Feb 2022US 2022/0051871 A1Kioxia Corporation
- Modular parallel electron lithography28 Oct 2021US 2021/0335572 A1
- Focused ion beam processing apparatus23 Sep 2021US 2021/0296080 A1Hitachi High-Tech Science Corporation
Most cited
By later US patents
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- Multiple beam electron beam lithography system88US 6,429,443 B1APPLIED Materials.Inc. · 2002
- Devices and methods for improved reflective electron beam lithography82US 8,722,286 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Device manufacture involving step-and-scan delineation79US 5,260,151 AAT&T Bell Laboratories · 1993
- Generating electrons with an activated photocathode68US 7,015,467 B2APPLIED Materials.Inc. · 2006