H01J 2237/31789
Reflection mask
H01J2237/31789 (Reflection mask) appears on 32 US grants and 22 published applications in this corpus.
Search patents in H01J- Granted patents
- 32
- Published applications
- 22
- Assignees
- 12
- Inventors
- 45
- Latest grant
- 20 Feb 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 1 |
| 2009 | 1 | 0 |
| 2010 | 2 | 0 |
| 2011 | 1 | 2 |
| 2012 | 3 | 0 |
| 2013 | 0 | 2 |
| 2014 | 1 | 5 |
| 2015 | 6 | 4 |
| 2016 | 7 | 5 |
| 2017 | 7 | 0 |
| 2018 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method and apparatus for transferring pixel data for electron beam lithography20 Feb 2018US 9,899,190 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Mirror array in digital pattern generator (DPG)27 Jun 2017US 9,690,208 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Linear Stage for reflective electron beam lithography27 Jun 2017US 9,690,213 B2KLA-Tencor Corporation
- Dynamic pattern generator and method of toggling mirror cells of the dynamic pattern generator13 Jun 2017US 9,679,747 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for electron beam lithography9 May 2017US 9,646,802 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Self-aligned dynamic pattern generator device and method of fabrication11 Aug 2016US 2016/0233054 A1Corporation for National Research Initiatives
- Bonding Pad Surface Damage Reduction in a Formation of Digital Pattern Generator4 Aug 2016US 2016/0225612 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus and methods for aberration correction in electron beam based system16 Jun 2016US 2016/0172151 A1KLA-Tencor Corporation
- Dynamic pattern generator and method of toggling mirror cells of the dynamic pattern generator26 May 2016US 2016/0148784 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and Apparatus for Electron Beam Lithography19 May 2016US 2016/0141144 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Devices and methods for improved reflective electron beam lithography82US 8,722,286 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Maskless reflection electron beam projection lithography55US 6,870,172 B1KLA-Tencor Technologies Corporation · 2005
- E-beam lithography with alignment gating27US 9,269,537 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Reflection mask and electrically charged beam exposing apparatus using the reflection mask18US 5,254,417 AKabushiki Kaisha Toshiba · 1993
- Method and apparatus for electron beam lithography15US 8,975,601 B1Taiwan Semiconductor Manufacturing Company.Ltd · 2015