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US 9,646,802 B2Granted
Method and apparatus for electron beam lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorYu-Chi Chen
Life of this patent
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Abstract
Disclosed is an apparatus in a semiconductor lithography system. The apparatus comprises a multiplexer and a plurality of imaging elements. The plurality is configured into a shift chain and an output of the shift chain is coupled to a data input of the multiplexer.
Claims20
An apparatus in a semiconductor lithography system, comprising:
- a first multiplexer;
- and
- a first plurality of imaging elements, wherein the first plurality is configured into a first shift chain and an output of the first shift chain is coupled to a data input of the first multiplexer.
A digital pattern generator (DPG) in a semiconductor lithography system using electron beam (e-beam), comprising:
- a first multiplexer;
- a first plurality of e-beam mirrors, wherein the first plurality is configured into a first shift chain and an output of the first shift chain is coupled to a data input of the first multiplexer;
- a second multiplexer;
- and
- a second plurality of e-beam mirrors, wherein the second plurality is configured into a second shift chain and an output of the second shift chain is coupled to a data input of the second multiplexer, wherein another data input of the first multiplexer and another data input of the second multiplexer are connected to a common node.
2 more elements
A digital pattern generator (DPG) in a semiconductor lithography system using electron beam (e-beam), comprising:
- a multiplexer;
- a first plurality of e-beam mirrors, wherein the first plurality of e-beam mirrors is configured into a first shift chain, and an output of the first shift chain is coupled to a data input of the multiplexer;
- and
- a second plurality of e-beam mirrors configured into a second shift chain, wherein:
- when the first plurality is used for imaging a semiconductor wafer, the second plurality is not used for imaging the semiconductor wafer;
- and
- when the first plurality is not used for imaging a semiconductor wafer, the second plurality is used for imaging the semiconductor wafer.
4 more elements
Dependencies are inferred from the claim text.