Mirror array in digital pattern generator (DPG)
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorTsung-Hsin Yu
Life of this patent
Estimating the term…
Abstract
Systems and method directed to digital pattern generator (DPG) having a mirror array in an e-beam lithography system are discussed. The mirror array includes a first bank of mirrors and a second bank of mirrors with a combination logic structure interposing the first and second banks of mirrors. An output data line extends from the first bank of mirrors to the combinational logic structure. An input data line that carries data associated with the second bank of mirrors is also provided to the combinational logic structure. An output data line extends from the combinational logic structure to second data bank.
Claims20
An electron-beam lithography system, comprising:
- a digital pattern generator (DPG) having a mirror array, wherein the mirror array includes:
- a first bank of mirrors and a second bank of mirrors;
- a combinational logic structure interposing the first and second banks of mirrors;
- a first output data line from the first bank of mirrors to the combinational logic structure;
- an input data line provided to the combinational logic structure, wherein the input data line carries data associated with the second bank of mirrors;
- and
- a second output data line from the combinational logic structure to second data bank.
A system, comprising:
- a plurality of mirror array banks disposed in a chain, wherein the plurality of mirror array banks has a first mirror array bank at one end and a terminal mirror array bank at an opposing end of the chain;
- a combinational logic structure interposing each of the plurality of mirror array banks;
- a first input line provided to the first mirror array bank;
- a plurality of additional input lines, each additional input line provided to one of the combinational logic structures;
- a single output line extending from the terminal mirror array bank;
- and
- a plurality of additional output lines one extending from the first mirror array bank to the adjacent combinational logic structure and one extending from each subsequent mirror array bank prior to the terminal mirror array bank to its adjacent combinational logic structure.
An electron-beam lithography system, comprising:
- a first bank of mirrors and a second bank of mirrors;
- a combinational logic structure interposing the first and second banks of mirrors, wherein the combinational logic structure is one of a XOR, XNOR, and a multiplexor (MUX);
- a first output data line from the first bank of mirrors to the combinational logic structure;
- an input data line provided to the combinational logic structure, wherein the input data line carries data associated with the second bank of mirrors;
- and
- a second output data line from the combinational logic structure to second data bank.
Dependencies are inferred from the claim text.