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US 5,254,417 AGranted
Reflection mask and electrically charged beam exposing apparatus using the reflection mask
AssigneeKabushiki Kaisha Toshiba
InventorHirotsugu Wada
Life of this patent
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Abstract
A reflection mask has a reflection pattern which is formed on a required portion of the surface of a substrate and on which a voltage sufficient to reflect incident electrically charged beams is applied, and a non-reflection pattern which is formed on the other portion of surface of the substrate and on which a voltage sufficient to emit the electrically charged beams to the non-reflection pattern is applied.
Claims9
A reflection mask comprising:
- a substrate having a surface comprising a selected portion and the other portion;
- a reflection pattern formed on said selected portion of said surface of said substrate;
- first voltage applying means for applying on said reflection pattern a voltage sufficient to reflect electrically charged beams irradiated to said reflection pattern;
- a non-reflection pattern provided on the other portion of said surface of said substrate;
- and
- second voltage applying means for applying on said non-reflection pattern a voltage sufficient to allow electrically charged beams to be incident on said non-reflection pattern.
3 more elements
An electrically charged beam exposing apparatus comprising:
- (a) electrically charged beam irradiating means for irradiating electrically charged beams;
- (b) electrically charged beam shaping means for shaping said electrically charged beams irradiated from said electrically charged beam irradiating means into a predetermined configuration;
- (c) a reflection mask illuminated with said electrically charged beams shaped by said electrically charged beam shaping means, said reflection mask comprising:
- (i) a substrate having a surface comprising a selected portion and the other portion;
- (ii) a reflection pattern formed on said selected portion of said surface of said substrate;
- (iii) first voltage applying means for applying on said reflection pattern a voltage sufficient to reflect electrically charged beams irradiated to said reflection pattern;
- (iv) a non-reflection pattern provided the other portion of said surface of said substrate;
- and
- (v) second voltage applying means for applying on said non-reflection pattern a voltage sufficient to allow electrically charged beams to be incident on said non-reflection pattern;
- and
- (d) a specimen loader on which a specimen irradiated by said electrically charged beams reflected by said reflection pattern is set.
8 more elements
An electrically charged beam exposing apparatus comprising:
- electrically charged beam irradiating means for irradiating electrically charged beams;
- electrically charged beam shaping means for shaping said electrically charged beams irradiated from said electrically charged beam irradiating means into a predetermined configuration;
- electrically charged beam deflecting means provided in a path of said electrically charged beams shaped by said electrically charged beam shaping means, for deflecting said electrically charged beams;
- a reflection mask on which said electrically charged beams are incident substantially perpendicularly to said reflection mask and which reflects said electrically charged beams having a predetermined shape in cross section to reenter said deflecting means;
- and
- a specimen loader for receiving a specimen on which said electrically charged beams reentering said electrically charged beams deflecting means and deflected thereby are incident.
3 more elements
Dependencies are inferred from the claim text.