H01J 2237/31779
From patterned photocathode
Official title: from patterned photocathode
H01J2237/31779 (From patterned photocathode) appears on 59 US grants and 31 published applications in this corpus.
Search patents in H01J- Granted patents
- 59
- Published applications
- 31
- Assignees
- 29
- Inventors
- 94
- Latest grant
- 4 Apr 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 4 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 4 | 0 |
| 2003 | 2 | 7 |
| 2004 | 2 | 4 |
| 2005 | 5 | 3 |
| 2006 | 5 | 2 |
| 2007 | 3 | 1 |
| 2008 | 1 | 1 |
| 2009 | 0 | 1 |
| 2010 | 2 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 2 |
| 2016 | 1 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
| 2020 | 3 | 3 |
| 2021 | 1 | 1 |
| 2022 | 1 | 1 |
| 2023 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Multiple electron beam writing apparatus and multiple electron beam writing method4 Apr 2023US 11,621,140 B2NuFlare Technology, Inc.
- Electron microscope15 Feb 2022US 11,251,011 B2Hitachi High-Tech Corporation
- Modular parallel electron lithography2 Mar 2021US 10,937,630 B1
- Multi-electron beam device1 Dec 2020US 10,854,424 B2Kabushiki Kaisha Toshiba
- Charged particle beam lithography apparatus and charged particle beam pattern writing method22 Sep 2020US 10,784,081 B2NuFlare Technology, Inc.
- Multiple electron beam writing apparatus and multiple electron beam writing method24 Feb 2022US 2022/0059310 A1NuFlare Technology, Inc.
- Modular parallel electron lithography28 Oct 2021US 2021/0335572 A1
- Electron microscope24 Sep 2020US 2020/0303152 A1Hitachi High-Technologies Corporation
- Multi-electron beam device3 Sep 2020US 2020/0279717 A1Kabushiki Kaisha Toshiba
- Charged particle beam lithography apparatus and charged particle beam pattern writing method20 Aug 2020US 2020/0266033 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- Multiple beam electron beam lithography system88US 6,429,443 B1APPLIED Materials.Inc. · 2002
- Generating electrons with an activated photocathode68US 7,015,467 B2APPLIED Materials.Inc. · 2006
- Maskless photon-electron spot-grid array printer64US 6,841,787 B2APPLIED Materials.Inc. · 2005
- Electron lithography apparatus50US 4,695,732 AU. S. Philips Corporation · 1987