Multiple beam electron beam lithography system
AssigneeApplied Materials, Inc.
InventorsMarian Mankos, Steven T Coyle, Andres Fernandez, Tai-Hon P Chang
Life of this patent
Estimating the term…
Abstract
Multiple beam electron beam lithography uses an array of vertical cavity surface emitting lasers (VCSELS) to generate laser beams, which are then converted to electron beams using a photocathode. The electron beams are scanned across a semiconductor substrate or lithography mask to imprint a pattern thereon. The use of VCSELs simplifies the design of the electron beam column and improves the throughput and writing resolution of the lithography system.
Claims9
A multiple beam electron beam lithography system comprising:
- a plurality of vertical cavity surface emitting lasers (VCSELs), said plurality of VCSELs being operable to generate a plurality of laser beams;
- a photocathode for converting said plurality of laser beams into a plurality of electron beams;
- and
- a writing plane in the path of said plurality of electron beams.
In an electron beam lithography system, a meth for writing a pattern on a writing plane, said method comprising the acts of:
- using a vertical cavity surface emitting laser (VCSEL) to generate a laser beam;
- converting said laser beam into an electron beam;
- and
- scanning said electron beam on said writing plane.
Dependencies are inferred from the claim text.