Maskless photon-electron spot-grid array printer

A method for exposing a substrate with an image, the method comprising the steps of:

• generating an array of optical beams;
• modulating the array of light beams individually in response to an input data signal;
• converting the optical beams to electron beams to provide an intermediate electron beam array;
• focusing the electron beams onto the substrate to expose a the substrate to a pattern of electron beams;
• and
• moving the substrate relative to the electron beams while the generating, modulating, converting and focusing steps are being performed to expose the substrate with an image comprising a sequence of electron beam patterns.

Maskless lithography apparatus comprising:

• a light source;
• a spatial light modulator positioned to receive light from the light source for providing an array of individually modulated optical beams in response to an input data signal;
• an array of lenses for focusing each of the optical beams;
• a photon-electron converter positioned at the focus of the optical beams for converting each optical beam to an electron beam;
• optics interposed between the spatial light modulator and the array of lenses for mapping the beams onto lenses in a one-to-one correspondence;
• an electron lens interposed between the photon-electron converter and the substrate for focusing the individual electron beams on the substrate;
• and
• a stage for providing relative movement between the substrate and the photon-electron converter such that the image is recorded on the substrate with the array of electron beams.

Maskless lithography apparatus comprising:

• a light source;
• a spatial light modulator positioned to receive light from the light source for providing an array of individually modulated optical beams in response to an input signal;
• an array of lenses for focusing each of the modulated optical beams;
• a photon-electron converter positioned at the focus of the modulated optical beams for converting each modulated optical beam to an electron beam;
• an electron demagnifier interposed between the photon-electron converter and the substrate;
• and
• a movable stage for supporting the substrate and for introducing a relative movement between the substrate and the photon-electron converter such that the image is recorded on the substrate with the array of electron beams.

Maskless lithography apparatus for exposing a substrate with an image formed by an array of electron beams, the system comprising:

• a programmable optical radiation source for providing an array of optical beams modulated in response to an input data signal and forming a sequence of optical patterns;
• a photon-electron converter, comprising an array of optically sensitive microtips, for converting the optical beams to electron spots and forming a sequence of electron spot patterns;
• electron optics for focusing electrons emitted from the electron spots onto the substrate;
• and
• a translator for introducing relative movement between the substrate and the focused electron spots such that the substrate is exposed with a sequence of focused electron spot patterns forming the image.