Device manufacture involving step-and-scan delineation
AssigneeAT&T Bell Laboratories
InventorsSteven D. Berger, Marvin Leventhal, James A. Liddle
Life of this patent
Estimating the term…
Abstract
Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching"--positioning of projected segment images to yield a satisfactory continuous image--is aided by lithographically defined skirts forming a continuous border within strut-supported segments.
Claims17
Method for device fabrication comprising at least one lithographic delineation step, comprising projection on an imaging material of charged particles containing imaging information comprising a continuous image, such particles being of velocity determined by an accelerating field, imaging information being imposed on such particles by passage through imaging regions of a mask,
- characterized in that included imaging regions correspond with mask segments, a plurality of which are required to define such continuous image on the imaging material, in that segmentation is the consequence of (1) struts of dimension and rigidity to assure mechanical reliability by supporting struts and of (2) lithographically-defined skirts adjacent such struts, so defining continuous skirts intermediate imaging regions and struts, imaging entailing deflection of imaging particles by interaction with direction-changing field of such timing and magnitude as to redirect particles to eliminate both struts and skirts in such image as constructed.
Dependencies are inferred from the claim text.