Focused ion beam processing apparatus

A focused ion beam processing apparatus for processing a cross-section parallel to an irradiation direction of a focused ion beam with respect to a sample comprising:

• an ion source;
• a sample stage holding a sample;
• a condenser lens focusing ions emitted from the ion source into a focused ion beam;
• an aperture having a slit with at least one side in a straight line shape, the slit being used to mask a part of the focused ion beam focused by the condenser lens to process the sample into a desired shape;
• a projection lens placed in a beam path between the aperture and the sample stage, and focusing the focused ion beam that passed through the aperture on a predetermined position on the sample;
• and
• a computer as a control means configured to control elements of the focused ion beam processing apparatus,
• wherein, in a transfer mode, the computer is configured to set:
• an applied voltage of the condenser lens to be 80% or more and less than 100% relative to an initial applied voltage of the condenser lens, wherein the initial applied voltage is set when the focused ion beam is focused on a main surface of the projection lens by Köhler illumination;
• a position of the aperture such that the focused ion beam is masked by the aperture with the at least one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam;
• and
• an applied voltage of the projection lens such that an image formed by the slit of the aperture is focused on a surface of the sample, and
• wherein the surface of the sample is irradiated at once with the focused ion beam that is formed in a shape of the slit without scanning with the focused ion beam so that the shape of the slit is transferred onto the sample in the transfer mode.