H01J 2237/31788
Through mask
Official title: through mask
H01J2237/31788 (Through mask) appears on 97 US grants and 51 published applications in this corpus.
Search patents in H01J- Granted patents
- 97
- Published applications
- 51
- Assignees
- 53
- Inventors
- 162
- Latest grant
- 8 Aug 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 7 | 0 |
| 1999 | 6 | 0 |
| 2000 | 1 | 0 |
| 2001 | 5 | 2 |
| 2002 | 6 | 4 |
| 2003 | 2 | 1 |
| 2004 | 4 | 11 |
| 2005 | 8 | 10 |
| 2006 | 5 | 2 |
| 2007 | 3 | 5 |
| 2008 | 3 | 1 |
| 2009 | 2 | 3 |
| 2010 | 4 | 0 |
| 2011 | 1 | 1 |
| 2012 | 1 | 0 |
| 2013 | 1 | 0 |
| 2014 | 0 | 2 |
| 2015 | 1 | 1 |
| 2016 | 2 | 1 |
| 2017 | 1 | 0 |
| 2018 | 1 | 1 |
| 2019 | 0 | 2 |
| 2020 | 2 | 1 |
| 2021 | 2 | 3 |
| 2022 | 1 | 0 |
| 2023 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Focused ion beam processing apparatus8 Aug 2023US 11,721,517 B2Hitachi High-Tech Science Corporation
- Charged particle beam lithography system21 Mar 2023US 11,610,758 B2Kkt Holdings Syndicate
- Ion beam lithography method based on ion beam lithography system27 Dec 2022US 11,538,653 B2Beijing Normal University
- Low energy e-beam contact printing lithography16 Mar 2021US 10,950,441 B1
- Charged particle beam writing apparatus and charged particle beam writing method23 Feb 2021US 10,930,469 B2NuFlare Technology, Inc.
- Focused ion beam processing apparatus23 Sep 2021US 2021/0296080 A1Hitachi High-Tech Science Corporation
- Ion beam lithography method based on ion beam lithography system17 Jun 2021US 2021/0183616 A1Beijing Normal University
- Low energy e-beam contact printing lithography4 Mar 2021US 2021/0066072 A1
- Charged Particle Beam Lithography System16 Jul 2020US 2020/0227235 A1Kkt Holdings Syndicate
- Charged particle beam writing apparatus and charged particle beam writing method25 Apr 2019US 2019/0122858 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Device manufacture involving step-and-scan delineation79US 5,260,151 AAT&T Bell Laboratories · 1993
- Ion beam lithography system54US 6,924,493 B1The Regents of the University of California · 2005
- Template mask lithography utilizing structured beam39US 6,372,391 B1University of Houston · 2002
- Masked ion beam lithography system and method34US 4,757,208 AHughes Aircraft Company · 1988
- Electron beam lithography system33US 5,466,904 AInternational Business Machines Corporation · 1995