H01J 2237/31781
From patterned cold cathode
Official title: from patterned cold cathode
H01J2237/31781 (From patterned cold cathode) appears on 33 US grants and 18 published applications in this corpus.
Search patents in H01J- Granted patents
- 33
- Published applications
- 18
- Assignees
- 17
- Inventors
- 44
- Latest grant
- 22 Sep 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 1 |
| 2004 | 2 | 3 |
| 2005 | 3 | 2 |
| 2006 | 2 | 2 |
| 2007 | 1 | 2 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 3 | 2 |
| 2011 | 1 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 2 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 2 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Charged particle beam lithography apparatus and charged particle beam pattern writing method22 Sep 2020US 10,784,081 B2NuFlare Technology, Inc.
- Charged particle beam lithography apparatus and charged particle beam pattern writing method16 Jun 2020US 10,685,809 B2NuFlare Technology, Inc.
- Individually switched field emission arrays29 Aug 2017US 9,748,071 B2Massachusetts Institute of Technology
- Apparatus and methods for electron beam lithography using array cathode25 Jul 2017US 9,715,995 B1KLA-Tencor Corporation
- Integrated circuits having interconnects and heat dissipators based on nanostructures9 Apr 2013US 8,415,787 B2Smoltek AB
- Charged particle beam lithography apparatus and charged particle beam pattern writing method20 Aug 2020US 2020/0266033 A1NuFlare Technology, Inc.
- Charged particle beam lithography apparatus and charged particle beam pattern writing method27 Jun 2019US 2019/0198293 A1NuFlare Technology, Inc.
- Individually switched field emission arrays24 Dec 2015US 2015/0371810 A1Massachusetts Institute of Technology
- Electron beam source system and method6 Sep 2012US 2012/0223245 A1
- Integrated Circuits Having Interconnects and Heat Dissipators Based on Nanostructures6 Sep 2012US 2012/0224327 A1Smoltek AB
Most cited
By later US patents
- Electro-lithography method57US 4,119,688 AInternational Business Machines Corporation · 1978
- Controlled growth of a nanostructure on a substrate34US 7,687,876 B2Smoltek AB · 2010
- Semiconductor device and method of manufacturing same, as well as a pick-up device and a display device having such a semiconductor device33US 4,259,678 AU. S. Philips Corporation · 1981
- Virtual mask digital electron beam lithography32US 5,892,231 ALockheed Martin Energy Research Corporation · 1999
- Thin-film electron emitter device having a multi-layer top electrode for suppressing degradation of an insulating layer and application apparatus using the same31US 5,936,257 AHitachi, Ltd. · 1999