H01J 2237/31786
Field-emitting cathode
H01J2237/31786 (Field-emitting cathode) appears on 14 US grants and 9 published applications in this corpus.
Search patents in H01J- Granted patents
- 14
- Published applications
- 9
- Assignees
- 8
- Inventors
- 16
- Latest grant
- 9 Apr 2013
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 2 | 1 |
| 2006 | 1 | 1 |
| 2007 | 1 | 2 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 2 | 2 |
| 2011 | 1 | 0 |
| 2012 | 1 | 1 |
| 2013 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Integrated circuits having interconnects and heat dissipators based on nanostructures9 Apr 2013US 8,415,787 B2Smoltek AB
- Integrated circuits having interconnects and heat dissipators based on nanostructures22 May 2012US 8,183,659 B2Smoltek AB
- Controlled growth of a nanostructure on a substrate, and electron emission devices based on the same12 Jul 2011US 7,977,761 B2Smoltek AB
- Integrated circuits having interconnects and heat dissipators based on nanostructures17 Aug 2010US 7,777,291 B2Smoltek AB
- Controlled growth of a nanostructure on a substrate30 Mar 2010US 7,687,876 B2Smoltek AB
- Integrated Circuits Having Interconnects and Heat Dissipators Based on Nanostructures6 Sep 2012US 2012/0224327 A1Smoltek AB
- Integrated Circuits Having Interconnects and Heat Dissipators Based on Nanostructures30 Dec 2010US 2010/0328898 A1Smoltek AB
- Controlled Growth of a Nanostructure on a Substrate, and Electron Emission Devices Based on the Same8 Jul 2010US 2010/0171093 A1Smoltek AB
- Controlled growth of a nanostructure on a substrate30 Apr 2009US 2009/0108251 A1Smoltek AB
- Digital parallel electron beam lithography stamp8 Nov 2007US 2007/0257212 A1
Most cited
By later US patents
- Controlled growth of a nanostructure on a substrate34US 7,687,876 B2Smoltek AB · 2010
- Virtual mask digital electron beam lithography32US 5,892,231 ALockheed Martin Energy Research Corporation · 1999
- Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy28US 6,498,349 B1UT-Battelle, LLC · 2002
- Digital electron lithography with field emission array (FEA)18US 6,014,203 AToyo Technologies, Inc. · 2000
- Integrated circuits having interconnects and heat dissipators based on nanostructures17US 7,777,291 B2Smoltek AB · 2010