US 5,892,231 A · Virtual mask digital electron beam lithography

Abstract

Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.

Claims20

Dependent claims

A digital direct write electron beam lithography system, comprising:

I) a digitally addressable field emission array including:
A) a digital computer interface;
B) a plurality of field emitters electrically connected to said digital computer interface, each of said plurality of individually addressable field emitters having an individual bias;
and
C) an electrostatic bias grid operably connected to said plurality of field emitters;
II) an electrostatic accelerator grid operably connected to said addressable field emission array;
III) a magnetic lens assembly operably connected to said electrostatic accelerator grid, said magnetic lens assembly including:
A) a telecentric magnetic lens system;
and
B) a correction magnetic lens system;
and
IV) a set of electrostatic deflection plates operably connected to said magnetic lens assembly.

9 more elements

Dependencies are inferred from the claim text.

Virtual mask digital electron beam lithography

Life of this patent

Virtual mask digital electron beam lithography

Life of this patent

Abstract

Claims20