Digital electron lithography with field emission array (FEA)

A digital electron lithography system which comprises:

• a plurality of cathodes for selectively emitting electrons, said plurality of cathodes being arranged in a row-column array and located in an x-y plane;
• a substantially flat substrate having a surface, said substrate surface being oriented substantially parallel to said array of cathodes and separated by a distance therefrom;
• a focusing magnet for establishing a magnetic field to direct electrons emitted from selected cathodes along substantially parallel respective electron paths to be focused on said substrate surface;
• and
• a steering magnet for influencing the magnetic field to selectively orient said electron paths at an inclination from a z direction to direct electrons from each cathode onto discrete pixels in a respective first pixel matrix on said substrate, the z direction being substantially perpendicular to the x-y plane, and wherein said steering magnet subsequently influences the magnetic field to digitally reorient said inclination of said electron paths to sequentially direct electrons from each cathode onto discrete pixels in a respective second pixel matrix on said substrate, said second pixel matrix of said cathode being a first pixel matrix of another said cathode.