Thin-film electron emitter device having a multi-layer top electrode for suppressing degradation of an insulating layer and application apparatus using the same

A thin-film electron emission device comprising:

• a multilayer thin-film structure including-upper and lower electrodes with an insulative layer sandwiched therebetween;
• said upper and lower electrodes adapted to receive a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof to a vacuum;
• said upper electrode having a three-layer structure of a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being less in sublimation enthalpy than said first layer and greater than said third layer.

A thin-film electron emmitter device comprising:

• a multilayer thin-film structure including upper and lower electrodes with an insulative layer laid therebetween;
• said upper and lower electrodes adapted to externally receive a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof to a vacuum;
• said upper electrode having a three-layer structure including a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said first layer being made of one selected from the group consisting of zirconium (Zr), hafnium (Hf), ruthenium (Ru), molybdenum (Mo), iridium (Ir), niobium (Nb), tantalum (Ta), rhenium (Re), osmium (Os), and tungsten (W) or an alloy of plural elements as selectes therefrom;
• said second layer comprising platinum (Pt);
• and
• said third layer being made of one selected from the group consisting of gold (AB), silver (Ag) and copper (Cu) or an alloy of plural ones as selected therefrom.

A thin-film electron emission device comprising:

• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween;
• said upper and lower electrodes adapted to receive a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof to a vacuum;
• said upper electrode having a two-layer structure of a first layer formed on said insulative layer and a second layer stacked on or above said first layer;
• said first layer being made of platinum (Pt);
• and
• said second layer being made of a material being less in sublimation enthalpy than said platinum.

A thin-film electron emission device comprising:

• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween;
• said upper and lower electrodes adapted to receive a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum;
• said upper electrode having a two-layer structure including a first layer formed on said insulative layer and a second layer stacked on or above said first layer;
• and
• said first layer being made of certain material being greater in sublimation enthalpy than said second layer;
• and
• a power supply lead layer electrically coupled to said upper electrode for supply of a voltage to said upper electrode.

An electron emitter application apparatus comprising an array of plural thin-film electron emission devices, each said device comprising:

• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween;
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum;
• said upper electrode having a two-layer structure of a first layer formed on said insulative layer and a second layer as sequentially stacked on said first layer;
• and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer.

An electron emitter application apparatus comprising:

• a thin-film electron emitter substrate as an electron source of said apparatus, said substrate having thereon an array of rows and columns of thin-film electron emitter devices;
• and
• each said device comprising:
• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a two-layer structure including a first layer formed on said insulative layer and a second layer stacked on said first layer, and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer.

A display apparatus comprising:

• a thin-film electron emitter device including,
• a multilayer thin-film structure having upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a two-layer structure including a first layer formed on said insulative layer and a second layer stacked on said first layer, and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer;
• a plate having a phosphor film thereon;
• and
• said thin-film electron emitter and said plate being disposed causing electrons emitted from said thin-film electron emitter to hit said phosphor film.

An electron-beam lithography apparatus comprising:

• at least one thin-film electron emitter device including,
• a multilayer thin-film structure having upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to exit electrons from a surface thereof into a vacuum,
• said upper electrode having a two-layer structure of a first layer formed on said insulative film and a second layer stacked on said first layer, and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer;
• and
• an electron lens located relative to said thin-film electron emitter device to allow electrons emitted from said thin-film electron emitter device to pass therethrough.

An electron beam lithography apparatus comnprising:

• a substrate;
• an array of thin-film electron emitter devices on said substrate, each of said device comprising,
• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a two-layer structure including a first layer formed on said insulative layer and a second layer stacked on said first layer, and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer;
• and
• an electron lens located relative to at least one of said thin-film electron emitter devices to allow electrons emitted from said thin-film electron emitter devices to pass therethrough.

An electron beam lithography apparatus comprising:

• a substrate;
• and
• an array of rows and columns of thin-film electron emitter devices on said substrate, each said device comprising,
• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a two-layer structure of a first layer formed on said insulative layer and a second layer stacked on said first layer, and
• said first layer being made of a material being greater in sublimation enthalpy than said second layer;
• and
• an electron lens located relative to at least one of said thin-film electron emitter devices to allow electrons emitted from said thin-film electron emitter device to pass therethrough.

An electron emitter application apparatus comprising an array of plural thin-film electron emission devices, each said device comprising:

• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween;
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum;
• said upper electrode having a three-layer structure of a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and greater than said third layer.

An electron emitter application apparatus comprising:

• a thin-film electron emitter substrate as an electron source of said apparatus, said substrate having thereon an array of rows and columns of thin-film electron emitter devices;
• and
• each said device comprising,
• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a three-layer structure including a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and greater than said third layer.

A display apparatus comprising:

• a thin-film electron emitter device including,
• a multilayer thin-film structure haying upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a three-layer structure including a first layer formed on said insulative layer, a secod layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and being greater than said third layer;
• a plate having a phosphor film thereon;
• and
• said electron emitter and said plate being disposed causing electrons emitted from said electron emitter to hit said phosphor film.

An electron-beam lithography apparatus comprising:

• at least one thin-film electron emitter device including,
• a multilayer thin-film structure having upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a three-layer structure of a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and greater than said third layer;
• and
• an electron lens located relative to said thin film electron emitter device to allow electrons emitted from said electron emitter device to pass therethrough.

An electron beam lithography apparatus comprising:

• a substrate;
• an array of thin-film electron emitter devices on said substrate, each said device comprising,
• a multilayer thin-film electron structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a three-layer structure including a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and greater than said third layer;
• and
• an electron lens located relative to at least one of said thin-film electron emitter devices to allow electrons emitted from said thin-film electron emitter device to pass therethrough.

An electron beam lithography apparatus comprising:

• a substrate;
• and
• an array of rows and columns of thin-film electron emitter devices on said substrate, each said device comprising,
• a multilayer thin-film structure including upper and lower electrodes with an insulative layer therebetween,
• said upper and lower electrodes receiving a voltage of a polarity with respect to the upper electrode allowing said upper electrode to emit electrons from a surface thereof into a vacuum,
• said upper electrode having a three-layer structure of a first layer formed on said insulative layer, a second layer stacked on said first layer and a third layer stacked on said second layer;
• and
• said second layer being made of a material having a sublimation enthalpy smaller than said first layer and greater than said third layer;
• and
• an electron lens located relative to at least one of said thin-film electron emitter devices to allow electrons emitted from said thin-film electron emitter device to pass therethrough.