Charged particle beam lithography apparatus and charged particle beam pattern writing method

A charged particle beam lithography apparatus, comprising:

• a plurality of multiple-beam sets, each of which including
• a plurality of irradiation sources each generating an independent charged particle beam,
• a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate as a target object, and
• a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object;
• a plurality of common deflection amplifiers, arranged for each of the plurality of multiple-beam sets, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set;
• a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each of the plurality of irradiation sources;
• and
• one or more multiple-beam clusters including the plurality of multiple-beam sets.