Apparatus and methods for electron beam lithography using array cathode

A method of electron beam lithography, the method comprising:

• generating an array of electron beams using an electron beam column with an array of cold cathode electron sources;
• selectively blank individual electron beams in the array of electron beams using driver circuitry underlying the array of cold cathode sources so as to create a patterned array of electron beams;
• focusing and demagnifying the patterned array of electron beams using an imaging system;
• and
• performing multiple passes of translating a target substrate under the patterned array of electron beams using a movable stage holding the target substrate,
• wherein a pattern is written onto an area the target substrate in first and second passes of the target substrate under the electron beam column,
• wherein a grid of pixels for the first pass is a rectangular grid that has a horizontal spacing between adjacent pixel positions in the horizontal direction and a vertical spacing between adjacent pixel positions in the vertical direction, and
• wherein a grid of pixels of the second pass is offset from the grid of pixels of the first pass by half the horizontal spacing in the horizontal direction and by half the vertical spacing in the vertical direction.

A system for electron beam lithography comprising:

• an array of cold cathode electron sources for generating an array of electron beams;
• driver circuitry underlying the array of cold cathode electron sources, the driver circuitry being configured to selectively blank individual electron beams in the array of electron beams so as to create a patterned array of electron beams;
• an imaging system configured to focus and demagnify the patterned array of electron beams;
• a target substrate held on a movable stage, wherein the movable stage is configured to translate the target substrate under the patterned array of electron beams;
• and
• a computer coupled to the driver circuitry, wherein drive signals sent by the computer to the driver circuitry causes a pattern to be written onto the target substrate to roll across the array in synchronization with the translation of the target substrate,
• wherein the pattern is written onto an area of the target substrate in first and second passes of the target substrate under the electron beam column,
• wherein a grid of pixels for the first pass is a rectangular grid that has a horizontal spacing between adjacent pixel positions in the horizontal direction and a vertical spacing between adjacent pixel positions in the vertical direction, and
• wherein a grid of pixels of the second pass is offset from the grid of pixels of the first pass by half the horizontal spacing in the horizontal direction and by half the vertical spacing in the vertical direction.