H01J 2237/31761
Patterning strategy
H01J2237/31761 (Patterning strategy) appears on 580 US grants and 460 published applications in this corpus.
Search patents in H01J- Granted patents
- 580
- Published applications
- 460
- Assignees
- 115
- Inventors
- 687
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 4 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 5 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 10 | 0 |
| 1994 | 11 | 0 |
| 1995 | 4 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 14 | 0 |
| 1999 | 24 | 0 |
| 2000 | 27 | 0 |
| 2001 | 21 | 6 |
| 2002 | 17 | 17 |
| 2003 | 30 | 13 |
| 2004 | 16 | 18 |
| 2005 | 9 | 15 |
| 2006 | 17 | 16 |
| 2007 | 10 | 22 |
| 2008 | 8 | 6 |
| 2009 | 16 | 4 |
| 2010 | 12 | 6 |
| 2011 | 1 | 6 |
| 2012 | 9 | 31 |
| 2013 | 22 | 33 |
| 2014 | 28 | 40 |
| 2015 | 35 | 37 |
| 2016 | 35 | 39 |
| 2017 | 38 | 34 |
| 2018 | 36 | 14 |
| 2019 | 23 | 14 |
| 2020 | 18 | 15 |
| 2021 | 12 | 10 |
| 2022 | 9 | 11 |
| 2023 | 9 | 20 |
| 2024 | 10 | 6 |
| 2025 | 10 | 13 |
| 2026 | 6 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Correction method of multi-beam exposure device21 Jul 2026US 12,687,789 B2Samsung Display Co., Ltd.
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method27 Jan 2026US 12,537,163 B2NuFlare Technology, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Method for generating proximity correction features for a lithographic mask pattern161US 5,663,893 AMicroUnity Systems Engineering, Inc. · 1997
- Energy beam exposure method and exposure apparatus143US 6,897,454 B2Kabushiki Kaisha Toshiba · 2005
- Multiphase printing for E-beam lithography110US 5,103,101 AEtec Systems, Inc. · 1992
- Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput80US 5,369,282 AFujitsu Limited · 1994
- Proximity correction method for E-beam lithography72US 5,241,185 AInternational Business Machines Corporation · 1993