H01J 2237/31764
Dividing into sub-patterns
H01J2237/31764 (Dividing into sub-patterns) appears on 295 US grants and 223 published applications in this corpus.
Search patents in H01J- Granted patents
- 295
- Published applications
- 223
- Assignees
- 63
- Inventors
- 337
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 9 | 0 |
| 1999 | 19 | 0 |
| 2000 | 18 | 0 |
| 2001 | 17 | 4 |
| 2002 | 9 | 10 |
| 2003 | 16 | 11 |
| 2004 | 11 | 8 |
| 2005 | 3 | 2 |
| 2006 | 7 | 5 |
| 2007 | 4 | 6 |
| 2008 | 1 | 2 |
| 2009 | 4 | 1 |
| 2010 | 5 | 1 |
| 2011 | 0 | 4 |
| 2012 | 5 | 19 |
| 2013 | 12 | 18 |
| 2014 | 16 | 23 |
| 2015 | 19 | 19 |
| 2016 | 17 | 21 |
| 2017 | 20 | 22 |
| 2018 | 22 | 9 |
| 2019 | 12 | 5 |
| 2020 | 5 | 3 |
| 2021 | 4 | 3 |
| 2022 | 2 | 3 |
| 2023 | 3 | 7 |
| 2024 | 4 | 1 |
| 2025 | 4 | 5 |
| 2026 | 2 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Coverage calculating method, charged particle beam writing method, coverage calculating device, charged particle beam writing apparatus, and computer-readable storage medium2 Dec 2025US 12,488,959 B2NuFlare Technology, Inc.
- Multi-electron beam writing apparatus and multi-electron beam writing method16 Sep 2025US 12,417,896 B2NuFlare Technology, Inc.
- Massive overlay metrology sampling with multiple measurement columns5 Aug 2025US 12,379,669 B2KLA Corporation
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Proximity correction method for E-beam lithography72US 5,241,185 AInternational Business Machines Corporation · 1993
- Electron beam exposure apparatus and its control method72US 6,107,636 ACanon Kabushiki Kaisha · 2000
- Electron beam writing method and system using large range deflection in combination with a continuously moving table65US 4,818,885 AInternational Business Machines Corporation · 1989
- Raster shaped beam writing strategy system and method for pattern generation60US 5,876,902 AEtec Systems, Inc. · 1999
- Charged particle beam transfer method51US 6,140,021 A2000