US 4,818,885 AGranted

Electron beam writing method and system using large range deflection in combination with a continuously moving table

AssigneeInternational Business Machines Corporation

InventorsDonald E. Davis, Samuel K. Doran, Merlyn H. Perkins, Hans C. Pfeiffer

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Abstract

This system employs writing of lithographic patterns with a shaped electron beam exposure system which minimizes the time wasted by workpiece positional requirements. The writing field contains an array of sub-fields written in a raster sequence. The large width of the writing field provided by the VAIL system reduces the number of mechanical scans required to write the pattern on the workpiece which further reduces the time required for workpiece positioning. When patterns are being superimposed over previously written patterns, registration is employed. This system includes a registration field confined to local areas on the workpiece, which is larger than the writing field, without requiring change in focus and without requiring the mechanical system comprising the X-Y work table to change speed during the registration and reregistration of the various fields on a semiconductor wafer or mask. The registration field can be larger than the writing field is possible because the quality requirements demanded from the shaped electron beam are less for detecting the locations of such registration marks at the various locations on the wafer.

Claims7

Dependent claims

Apparatus for writing, upon a workpiece supported on a work table, a pattern having a size larger than a pattern writing field, comprising:

(a) an electron beam means for generating a writing electron beam to be positioned anywhere within predetermined dimensions on said work table,
(b) said work table transporting the position of said workpiece relative to said electron beam,
(c) said workpiece having predetermined registration marks thereon,
(d) control means for receiving position data and for generating control signals in response thereto having at least one input and at least one output,
(e) said control means operating in accordance with a program for providing a predetermined pattern of exposure of said electron beam to said workpiece,
(f) deflection means connected to a said output of said control means for providing deflection of an electron beam in response to said control means,
(g) said electron beam means being juxtaposed with said deflection means,
(h) drive means for continuously transporting said workpiece along a path relative to said electron beam, said drive means having an input connected to a said output of said control means,
(i) registration detection means for providing a measurement of the position of said registration marks on said workpiece with respect to said electron beam without interruption of motion of said work table and said registration detection means including means for providing registration position data based upon said measurement to said control means simultaneously with the motion of said table,
(j) said registration detection means having an output connected to a said input of said control means, and
(k) said control means including means for generating workpiece position correction data relative to said work table as a function of the output of said registration detection means,
(l) wherein said control means provides said position correction data for correcting said predetermined pattern of exposure as a function of said correction data.

9 more elements

Apparatus for writing, upon a workpiece, a pattern having a size larger than a pattern writing field, comprising:

(a) a work table for carrying said workpiece,
(b) electron beam means for generating a shaped writing electron beam which may be positioned anywhere within predetermined dimensions on said work table,
(c) said workpiece having predetermined registration marks thereon,
(c) control means for receiving position data and for generating control signals in response thereto, said control means having at least one input and at least one output,
(d) said control means including a program for a predetermined pattern of exposure of said electron beam to said workpiece,
(e) deflection means for providing deflection of an electron beam, said deflection means having an input connected to an output of said control means to control said deflection means,
(f) drive means for continuously transporting said workpiece along a continuous path relative to said electron beam, said drive means having a plurality of inputs with one thereof connected to a said output of said control means,
(g) a velocity control system having an output connected to a said input of said drive means, and said velocity control system having an input connected to a said output of said control means,
(h) registration detection means for providing a measurement of the position of said registration marks on said workpiece with respect to said electron beam without interruption of motion of said table and providing registration position data based upon said measurement to a said input of said control means,
(i) work table position sensing means for measuring the workpiece transport mechanism position and velocity and providing corrections to control signals provided to said deflection means and to said velocity control system,
(j) said control means generating workpiece position correction data relative to said work table, as a function of the output of said registration detection means and said work table position sensing means, and
(k) said control means employing said position correction data for correcting said predetermined pattern of exposure as a function of said correction data.

9 more elements

Apparatus for writing, upon a workpiece, a pattern having a size larger than a pattern writing field, comprising:

(a) a work table for carrying said workpiece,
(b) electron beam means for generating a shaped writing electron beam which may be positioned anywhere within predetermined dimensions on said work table,
(c) control means for receiving position data and for generating control signals in response thereto,
(d) said control means including a program for a predetermined pattern of exposure of said electron beam to said workpiece,
(e) deflection means for providing deflection of an electron beam, said deflection means having an input connected to an output of said control means to control said deflection means,
(f) drive means for continuously transporting said workpiece along a continuous path relative to said electron beam connected to an output of said control means, said drive means having a velocity control input
(g) a velocity control system having an output connected to said velocity control input of said drive means,
(h) registration detection means for measuring the position of said workpiece with respect to said electron beam without interruption of motion of said table and providing registration position data to said control means,
(i) work table position sensing means for measuring the workpiece transport mechanism position and velocity and providing corrections to control signals provided to said deflection means and to said velocity control system,
(j) said control means generating workpiece position correction data relative to the work table, as a function of the output of said registration detection means and said work table position sensing means, and
(k) said control means employing said position correction data for correcting said predetermined pattern of exposure as a function of said correction data,
(l) means for scanning a writing deflection area with a predetermined degree of beam focus with a predetermined degree of precision, and
(m) means for moving said beam beyond said writing deflection area to registration points well beyond said writing defletion area for registering said workpiece relative to said beam to a plurality of registration points.

10 more elements

An electron-beam lithography apparatus for writing, upon a workpiece, a pattern having a size larger than a pattern writing field, comprising:

(a) a work table for carrying said workpiece,
(b) electron beam means for generating a shaped writing electron beam which may be positioned anywhere within predetermined dimensions on said work table,
(c) control means for receiving position data and for generating control signals in response thereto,
(d) said control means including a program for a predetermined pattern of exposure of said electron beam to said workpiece,
(e) deflection means for providing deflection of an electron beam, said deflection means having an input connected to an output of said control means to control said deflection means,
(f) drive means for continuously transporting said workpiece along a continuous path relative to said electron beam connected to an output of said control means, said drive means having a velocity control input,
(g) a velocity control system having an output connected to said velocity control input of said drive means,
(g) registration detection means for measuring the position of said workpiece with respect to said electron beam without interruption of motion of said table and providing registration position data to said control means,
(h) work table position sensing means for measuring the workpiece transport mechanism position and velocity and providing corrections to control signals provided to said deflection means and to said velocity control system,
(i) said control means generating workpiece position correction data relative to the work table, as a function of the output of said registration detection means and said work table position sensing means,
(j) said control means employing said position correction data for correcting said predetermined pattern of exposure as a function of said correction data,
(k) an electron beam source work supporting surface,
(l) a variable axis immersion lens projection system cooperating with said electron beam source work supporting surface, and
(m) a continuously moving mechanical work table, a registration deflection that is larger than the writing deflection, with higher resolution over a larger area while maintaining the registration accuracy systems within predetermined limits.

11 more elements

Dependencies are inferred from the claim text.