Multi-electron beam writing apparatus and multi-electron beam writing method

A multi-electron beam writing apparatus comprising:

• a light source array configured to include a plurality of light sources and generate a plurality of first lights;
• a multi-lens array configured to include a plurality of first lenses, and to divide the plurality of first lights into a plurality of second lights by that each of the plurality of first lights illuminates a corresponding lens set of a plurality of lens sets each of which are composed of a plurality of second lenses being a portion of the plurality of first lenses and by that each of lenses, which are at least a part of the plurality of second lenses, is irradiated with two or more first lights of the plurality of first lights;
• a photoemissive surface configured to receive the plurality of second lights through its upper surface, and emit multiple photoelectron beams from its back surface;
• a blanking aperture array mechanism configured to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams;
• and
• an electron optical system configured to irradiate a target object with the multiple photoelectron beams.