Back to results
US 6,107,636 AGranted
Electron beam exposure apparatus and its control method
AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Estimating the term…
An electron beam exposure apparatus for drawing a pattern on an object to be exposed using a plurality of electron beams includes an electron source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of the electron source, a projection electron optical system for projecting the plurality of intermediate images onto the object, a scanning unit for scanning the plurality of intermediate images to be projected onto the object within a plurality of elementary exposure fields in accordance with a common scanning width so as to expose a unit exposure field made up of the plurality of elementary exposure fields, and an adjustment unit for dynamically adjusting a minimum scanning width of the common scanning width in correspondence with a feature of a pattern to be drawn by exposure in the corresponding unit exposure field of the object.
An electron beam exposure apparatus for drawing a pattern on an object to be exposed using a plurality of electron beams, said apparatus comprising:
A method of controlling an electron beam exposure apparatus, which has an electron source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of said electron source, a projection electron optical system for projecting the plurality of intermediate images onto an object to be exposed, and a scanning unit for scanning the plurality of intermediate images to be projected onto the object within a plurality of elementary exposure fields in accordance with a common scanning width so as to expose a unit exposure field made up of the plurality of elementary exposure fields, said method comprising the step of:
A method of generating exposure control data used for controlling an electron beam exposure apparatus, which has an electron source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of said electron source, a projection electron optical system for projecting the plurality of intermediate images onto an object to be exposed, and a scanning unit for scanning the plurality of intermediate images to be projected onto the object within a plurality of elementary exposure fields in accordance with a common scanning width so as to expose a unit exposure field made up of the plurality of elementary exposure fields, said method comprising the steps of:
Dependencies are inferred from the claim text.