H01J 2237/31767
Step and repeat
H01J2237/31767 (Step and repeat) appears on 22 US grants and 9 published applications in this corpus.
Search patents in H01J- Granted patents
- 22
- Published applications
- 9
- Assignees
- 15
- Inventors
- 45
- Latest grant
- 4 Nov 2014
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 0 | 0 |
| 2003 | 2 | 1 |
| 2004 | 1 | 2 |
| 2005 | 1 | 1 |
| 2006 | 2 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Drawing apparatus, and method of manufacturing article4 Nov 2014US 8,878,141 B2Canon Kabushiki Kaisha
- Mask, exposure method and production method of semiconductor device14 Apr 2009US 7,517,618 B2Sony Corporation
- Multi-electron beam exposure method and apparatus24 Oct 2006US 7,126,140 B2Advantest Corporation
- Multi-electron beam exposure method and apparatus27 Jun 2006US 7,067,830 B2Advantest Corporation
- Method and device for rastering source redundancy17 May 2005US 6,894,435 B2APPLIED Materials.Inc.
- High throughput multi-beam charged particle inspection system with dynamic control22 Jan 2026US 2026/0024721 A1Carl Zeiss MultiSEM GmbH
- High throughput multi-beam charged particle inspection system with dynamic control9 Feb 2023US 2023/0043036 A1
- Drawing apparatus, and method of manufacturing article4 Jul 2013US 2013/0168569 A1Canon Kabushiki Kaisha
- Multi-electron beam exposure method and apparatus26 Jan 2006US 2006/0017021 A1Advantest Corporation
- Mask, exposure method and production method of semiconductor device4 Aug 2005US 2005/0170265 A1Sony Corporation
Most cited
By later US patents
- Electron beam lithography system and method63US 5,334,282 AHitachi, Ltd. · 1994
- Electron beam exposure apparatus38US 6,225,637 B1Canon Kabushiki Kaisha · 2001
- Photo reticle for fabricating a semiconductor device34US 5,250,983 ANEC Corporation · 1993
- Method for correcting placement errors in a lithography system24US 5,773,836 AInternational Business Machines Corporation · 1998
- Exposure method and exposure apparatus23US 6,645,701 B1Nikon Corporation · 2003