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US 5,250,983 AGranted
Photo reticle for fabricating a semiconductor device
AssigneeNEC Corporation
InventorRyuji Yamamura
Life of this patent
Estimating the term…
Abstract
An original layout pattern for reticle includes a tip pattern region, a scribe region formed around the tip pattern region, and alignment marks formed in the scribe region. Each end of the alignment marks is not reached to a edge of the original layout pattern. Therefore, when the original layout pattern is formed on the reticle side by side in predetermined times, the alignment marks positioned at an inner portion between two adjacent patterns are separated from each other.
Claims3
A reticle for fabricating a semiconductor device, comprising:
- a plurality of tip pattern regions;
- a scribe region surrounding said plurality of tip pattern regions;
- a repeat region provided at an outer periphery of said scribe region;
- a first alignment mark provided on said scribe region used for detection of rotation from a standard angle, said first alignment mark being terminated on a border line between said scribe and repeat regions;
- and
- a second alignment mark provided on both sides of a symmetrical line defined on said scribe region between said plurality of tip pattern regions, said second alignment mark being composed of first and second mark segments separated by said symmetrical line, said first and second mark segments being common in configuration partially to said first alignment mark.
3 more elements
Dependencies are inferred from the claim text.