Method and device for rastering source redundancy
AssigneeApplied Materials, Inc.
InventorsDavid Aviel, Jimmy Vishnipolsky, Radel Ben-Av
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AssigneeApplied Materials, Inc.
InventorsDavid Aviel, Jimmy Vishnipolsky, Radel Ben-Av
Estimating the term…
A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.
A method for irradiating a plurality of target points on a specimen with charged particles, comprising:
A charged particle beam source for emitting a plurality of charged particle beams, comprising:
A data feed system for a charged particle source array, comprising
Dependencies are inferred from the claim text.