Electron beam exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsShigeru Terashima, Masato Muraki, Masahiko Okunuki, Akira Miyake, Shin Matsui
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Abstract
An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.
Claims70
An electron beam exposure apparatus for projecting an image formed by electron beams onto an object to be exposed via a reduction electron optical system, comprising:
- carrying means for carrying the object to be exposed;
- and
- irradiation means for irradiating electron beams having an arcuated sectional shape sandwiched between two arcs having, as a center, an axis of said reduction electron optical system, toward the object to be exposed.
An electron beam generation apparatus comprising:
- an electron beam source for emitting electron beams;
- and
- first deflection means, having two cylindrical surface electrodes having a first axis as a center, for deflecting the electron beams emitted by said electron beam source by an electric field across the two cylindrical surface electrodes.
An aperture board for defining a sectional shape of electron beams in an electron beam exposure apparatus for projecting an image defined by the electron beams onto an object to be exposed via a reduction electron optical system, comprising:
- an aperture having an arcuated sectional shape sandwiched between two arcs having a common axis as a center.
An electron beam exposure method for projecting an image formed by electron beams onto an object to be exposed via a reduction electron optical system, comprising the step of:
- exposing an entire exposure region on the object to be exposed by scanning electron beams having an arcuated sectional shape sandwiched between two arcs having, as a center, an axis of said reduction electron optical system, on the object to be exposed.
An electron beam exposure method for projecting an image formed by electron beams onto an object to be exposed via a reduction electron optical system, comprising the steps of:
- projecting an image of light having an arcuated sectional shape sandwiched between two arcs having, as the center, the axis of said reduction electron optical system, onto a photoelectric conversion surface of a photoelectric conversion member;
- accelerating and irradiating electron beams having an arcuated sectional shape output from the photoelectric conversion surface in a direction of the object to be exposed;
- and
- scanning the electron beams having the arcuated sectional shape on the object to be exposed, thereby exposing an entire exposure region on the object to be exposed.
An electron beam exposure method for projecting an image formed by electron beams onto an object to be exposed via a reduction electron optical system, comprising the steps of:
- deflecting electron beams emitted by an electron beam source by an electric field across two cylindrical surface electrodes having a first axis as a center;
- irradiating the deflected electron beams onto an aperture board having an arcuated aperture sandwiched between two arcs having, as a center, an axis of said reduction electron optical system;
- irradiating electron beams having an arcuated sectional shape, which have been transmitted through the aperture toward the object to be exposed;
- and
- scanning the electron beams having the arcuated sectional shape on the object to be exposed,
- thereby exposing an entire exposure region on the object to be exposed.
An electron beam exposure method for projecting an image formed by electron beams onto an object to be exposed via a reduction electron optical system, comprising the steps of:
- deflecting electron beams emitted by an electron beam source by an electric field across two cylindrical surface electrodes having a first axis as a center;
- further deflecting the deflected electron beams by an electric field, in a direction opposite to a direction of the electric field, across two cylindrical surface electrodes having a second axis as a center;
- irradiating the deflected electron beams onto an aperture board having an arcuated aperture sandwiched between two arcs having, as a center, an axis of said reduction electron optical system;
- irradiating electron beams having an arcuated sectional shape, which have been transmitted through the aperture toward the object to be exposed;
- and
- scanning the electron beams having the arcuted sectional shape on the object to be exposed,
- thereby exposing an entire exposure region on the object to be exposed.
Dependencies are inferred from the claim text.