Drawing apparatus, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorsWataru YAMAGUCHI, Takahiro MATSUMOTO
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Abstract
The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark.
Claims6
A drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus comprising:
- a stage configured to hold the substrate and to be moved;
- a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams;
- a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage;
- and
- a processor configured to perform a process of obtaining a position of the mark,
- wherein the processor is configured to control the stage, the charged particle optical system, and the detector such that a position of a first mark element is measured while two ends of the first mark element fall within a range of deflection by the deflector with respect to a first charged particle beam among the plurality of charged particle beams, and a position of a second mark element, different from the first mark element, is measured while two ends of the second mark element fall within a range of deflection by the deflector with respect to a second charged particle beam, among the plurality of charged particle beams, closer to the second mark element than the first charged particle beam.
A method of manufacturing an article, the method comprising:
- performing drawing on a substrate using a drawing apparatus;
- developing the substrate on which the drawing has been performed;
- and
- processing the developed substrate to manufacture the article,
- wherein the drawing apparatus performs the drawing on the substrate with a plurality of charged particle beams, the apparatus including
- a stage configured to hold the substrate and to be moved;
- a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams;
- a detector configured to detect a charged particle that arrives thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage;
- and
- a processor configured to perform a process of obtaining a position of the mark,
- wherein the processor is configured to control the stage, the charged particle optical system, and the detector such that a position of a first mark element is measured while two ends of the first mark element fall within a range of deflection by the deflector with respect to a first charged particle beam among the plurality of charged particle beams, and a position of a second mark element, different from the first mark element, is measured while two ends of the second mark element fall within a range of deflection by the deflector with respect to a second charged particle beam, among the plurality of charged particle beams, closer to the second mark element than the first charged particle beam.
Dependencies are inferred from the claim text.