H01J 2237/31766
Continuous moving of wafer
H01J2237/31766 (Continuous moving of wafer) appears on 100 US grants and 96 published applications in this corpus.
Search patents in H01J- Granted patents
- 100
- Published applications
- 96
- Assignees
- 37
- Inventors
- 195
- Latest grant
- 22 Oct 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 1 | 1 |
| 2002 | 4 | 3 |
| 2003 | 5 | 1 |
| 2004 | 1 | 3 |
| 2005 | 1 | 3 |
| 2006 | 5 | 3 |
| 2007 | 2 | 11 |
| 2008 | 2 | 1 |
| 2009 | 6 | 3 |
| 2010 | 3 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 6 |
| 2013 | 4 | 3 |
| 2014 | 5 | 4 |
| 2015 | 4 | 9 |
| 2016 | 4 | 9 |
| 2017 | 9 | 6 |
| 2018 | 6 | 3 |
| 2019 | 4 | 3 |
| 2020 | 4 | 2 |
| 2021 | 3 | 3 |
| 2022 | 3 | 2 |
| 2023 | 0 | 3 |
| 2024 | 3 | 1 |
| 2025 | 0 | 7 |
| 2026 | 0 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Multi-beam electronics scan18 Jun 2024US 12,014,895 B2KLA Corporation
- Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method13 Feb 2024US 11,901,156 B2NuFlare Technology, Inc.
- Multi-beam writing method and multi-beam writing apparatus18 Oct 2022US 11,476,086 B2NuFlare Technology, Inc.
- Multibeamlet charged particle device and method19 Apr 2022US 11,309,163 B2APPLIED Materials.Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and multi-charged particle beam writing apparatus18 Jun 2026US 2026/0171356 A1NuFlare Technology, Inc.
- Multi-charged-particle-beam writing method and multi-charged-particle-beam writing apparatus11 Jun 2026US 2026/0162933 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Electron beam writing method and system using large range deflection in combination with a continuously moving table65US 4,818,885 AInternational Business Machines Corporation · 1989
- Raster shaped beam writing strategy system and method for pattern generation60US 5,876,902 AEtec Systems, Inc. · 1999
- Particle-beam exposure apparatus with overall-modulation of a patterned beam43US 7,781,748 B2IMS Nanofabrication GmbH · 2010
- Charged-particle beam exposure method37US 5,399,872 AFujitsu Limited · 1995
- Electron beam exposure method using a moving stage34US 6,040,583 ANEC Corporation · 2000