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AssigneeNuFlare Technology, Inc.
InventorsHayato KIMURA, Takuya MATSUKAWA, Kei HASEGAWA
Estimating the term…
In one embodiment, a writing method includes calculating irradiation times for each shot of individual beams of multiple charged particle beams, setting, based on the calculated irradiation times, an ON or OFF state of each individual beam at each irradiation step in a shot cycle comprising a plurality of irradiation steps, extracting a number of beams set in the ON state at a longest irradiation step in each shot with the multiple charged particle beams, determining, based on the extracted number of beams, whether to change the shot cycle, and sequentially applying, based on the determining, the beams corresponding to the irradiation times of the plurality of irradiation steps to a substrate placed on a stage to write a pattern on the substrate, while performing tracking control such that an irradiation region irradiated with the multiple charged particle beams follows movement of the stage.
A multi-charged-particle-beam writing method comprising:
A multi-charged-particle-beam writing apparatus comprising:
Dependencies are inferred from the claim text.