Multi-beam writing method and multi-beam writing apparatus

A multi-beam writing apparatus comprising:

• a parameter acquisition circuit configured to acquire a pixel size which is variable and beam array information defining a beam array to be used for exposure;
• an acquisition circuit configured to acquire, based on the pixel size and the beam array information, a plurality of deflection coordinates for deflecting a beam to each of a plurality of pixels which are in each beam pitch region of a plurality of beam pitch regions obtained by dividing a writing region on a target object by a beam pitch size of multiple beams, a number of pixels to be exposed by a beam in the each beam pitch region during each of tracking control periods performed such that the multiple beams collectively follow a movement of a stage, and a deflection movement amount of the multiple beams at a time of tracking reset for resetting a tracking starting position after a tracking control period has passed;
• a generation circuit configured to generate a deflection sequence defined using the plurality of deflection coordinates, the number of pixels to be exposed during each of the tracking control periods, and the deflection movement amount of the multiple beams at the time of tracking reset;
• a writing mechanism configured to include a movable stage for mounting the target object thereon and a deflector for deflecting the multiple beams, and configured to write a pattern on the target object with the multiple beams while deflecting the multiple beams according to the deflection sequence;
• and
• a deflection movement amount calculation circuit configured to calculate the deflection movement amount of the multiple beams at the time of tracking reset, using identification information for identifying a beam array to be used for exposure in the multiple beams whose beam pitch size is set at least during writing the writing region.

A multi-beam writing method comprising:

• selecting a writing mode from a high accuracy writing mode for writing highly accurately and a high speed writing mode for writing at high speed;
• dividing a writing region on a target object to be irradiated with multiple beams into a plurality of pixel regions by a pixel size which is variable according to the writing mode selected;
• and
• writing a pattern on the target object by applying the multiple beams whose beam pitch is fixed regardless of the writing mode selected to a plurality of pixels on the target object divided by the pixel size,
• wherein tracking control is performed such that the multiple beams collectively follow a movement of a stage in a case of writing the pattern, further comprising:
• calculating a deflection movement amount of the multiple beams at a time of tracking reset for resetting a tracking starting position after a tracking control period has passed, using identification information for identifying a beam array, to be used for exposure, set according to the writing mode selected, in the multiple beams.

A multi-beam writing apparatus comprising:

• a selection circuit configured to select a writing mode from a high accuracy writing mode for writing highly accurately and a high speed writing mode for writing at high speed;
• a division circuit configured to divide a writing region on a target object to be irradiated with multiple beams into a plurality of pixel regions by a pixel size which is variable according to the writing mode selected;
• and
• a writing mechanism configured to include a stage for mounting the target object thereon and a deflector for deflecting the multiple beams, and to write a pattern on the target object by applying the multiple beams whose beam pitch is fixed regardless of the writing mode selected to a plurality of pixels on the target object divided by the pixel size,
• wherein tracking control is performed such that the multiple beams collectively follow a movement of the stage in a case of writing the pattern, further comprising:
• calculating a deflection movement amount of the multiple beams at a time of tracking reset for resetting a tracking starting position after a tracking control period has passed, using identification information for identifying a beam array, to be used for exposure, set according to the writing mode selected, in the multiple beams.