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US 5,399,872 AGranted
Charged-particle beam exposure method
AssigneeFujitsu Limited
InventorsHiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Soichiro Arai, Yoshihisa Oae
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AssigneeFujitsu Limited
InventorsHiroshi Yasuda, Junichi Kai, Hisayasu Nishino, Soichiro Arai, Yoshihisa Oae
Estimating the term…
A charged-particle beam exposure method is used for a charged-particle beam exposure apparatus equipped with a blanking aperture array plate in which columns are arranged side by side in a first direction, and each of the columns includes a plurality of blanking apertures arranged in a second direction substantially perpendicular to the first direction, a charged-particle beam being moved on a wafer in the first direction. The method includes the steps of (a) determining one of first and second axes of a pattern to be exposed to be a priority axis; (b) projecting an image of the blanking aperture array plate onto the wafer so that the priority axis is perpendicular to the second direction; and (c) deflecting the charged-particle beam so that the wafer is scanned in the direction of the priority axis.
A charged-particle beam exposure method using a charged-particle beam exposure apparatus equipped with a blanking aperture array plate in which columns are arranged side by side in a first direction, and each of the columns includes a plurality of blanking apertures arranged in a second direction substantially perpendicular to the first direction, a charged-particle beam being moved on a wafer in the first direction, said charged-particle beam exposure method comprising the steps of:
Dependencies are inferred from the claim text.