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  1. Technology classes
  2. /H · Electricity
  3. /H01 · Electric elements
  4. /H01J · Electric discharge tubes or discharge lamps
  5. /H01J 2237/00 · Discharge tubes exposing object to beam
  6. /H01J 2237/30 · Electron or ion beam tubes for processing objects
  7. /H01J 2237/317 · Processing objects on a microscale
  8. /H01J 2237/3175 · Lithography
  9. /H01J 2237/31772
H01J 2237/31772

Flood beam

H01J2237/31772 (Flood beam) appears on 2 US grants and 2 published applications in this corpus.

Search patents in H01J

Where it sits

  1. HElectricity
  2. H01Electric elements
  3. H01JElectric discharge tubes or discharge lamps
  4. H01J 2237/00Discharge tubes exposing object to beam
  5. H01J 2237/30Electron or ion beam tubes for processing objects
  6. H01J 2237/317Processing objects on a microscale
  7. H01J 2237/3175Lithography
  8. H01J 2237/31772Flood beam
Granted patents
2
Published applications
2
Assignees
3
Inventors
7
Latest grant
7 Jan 2020

Filings by year

Granted patentsPublished applications
H01J 2237/31772: granted patents and published applications per publication year
YearGranted patentsPublished applications
201101
201210
201300
201400
201500
201600
201700
201800
201900
202010
202100
202200
202300
202400
202500
202601

2011201220132014201520162017201820192020202120222023202420252026

By publication year. 2026 runs to 8 Oct.

Recent patents

  • Electron flood lithography7 Jan 2020US 10,529,537 B1Facebook Technologies, LLC
  • Self-contained proximity effect correction inspiration for advanced lithography (special)15 May 2012US 8,178,280 B2Taiwan Semiconductor Manufacturing Company.Ltd
  • Ru etching induced by electron beam irradiation and remote plasma28 May 2026US 2026/0148934 A1University of Maryland, College Park
  • Self-contained proximity effect correction inspiration for advanced lithography (special)11 Aug 2011US 2011/0195359 A1Taiwan Semiconductor Manufacturing Company.Ltd

Most cited

By later US patents
  • Self-contained proximity effect correction inspiration for advanced lithography (special)5US 8,178,280 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2012

Top assignees

Documents
  • TSTaiwan Semiconductor Manufacturing Company.Ltd2
  • FTFacebook Technologies, LLC1
  • University of Maryland, College Park1

Often classified with

  • G03FPhotomechanical production of textured or patterned surfaces3
  • H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
  • Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2

Documents that also carry the other class.

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