H01J 2237/31776
Shaped beam
H01J2237/31776 (Shaped beam) appears on 325 US grants and 262 published applications in this corpus.
Search patents in H01J- Granted patents
- 325
- Published applications
- 262
- Assignees
- 59
- Inventors
- 369
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 5 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 8 | 0 |
| 1993 | 7 | 0 |
| 1994 | 8 | 0 |
| 1995 | 7 | 0 |
| 1996 | 5 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 7 | 0 |
| 2000 | 10 | 0 |
| 2001 | 15 | 2 |
| 2002 | 5 | 13 |
| 2003 | 12 | 9 |
| 2004 | 9 | 9 |
| 2005 | 7 | 8 |
| 2006 | 12 | 13 |
| 2007 | 3 | 7 |
| 2008 | 3 | 0 |
| 2009 | 6 | 2 |
| 2010 | 5 | 2 |
| 2011 | 0 | 9 |
| 2012 | 9 | 22 |
| 2013 | 12 | 23 |
| 2014 | 19 | 19 |
| 2015 | 15 | 18 |
| 2016 | 18 | 17 |
| 2017 | 14 | 10 |
| 2018 | 9 | 17 |
| 2019 | 21 | 15 |
| 2020 | 11 | 10 |
| 2021 | 7 | 4 |
| 2022 | 6 | 6 |
| 2023 | 8 | 14 |
| 2024 | 4 | 6 |
| 2025 | 7 | 3 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium28 Oct 2025US 12,456,601 B2NuFlare Technology, Inc.
- Semiconductor apparatus and method of operating the same19 Aug 2025US 12,393,114 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for electron beam exposure28 May 2026US 2026/0148930 A1
- Raster beam writing method and raster beam writing apparatus12 Mar 2026US 2026/0074144 A1NuFlare Technology, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus, and non-transitory computer-readable storage medium storing a program5 Mar 2026US 2026/0066219 A1NuFlare Technology, Inc.
- Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure Apparatus13 Nov 2025US 2025/0349508 A1IMS Nanofabrication GmbH
Most cited
By later US patents
- Energy beam exposure method and exposure apparatus143US 6,897,454 B2Kabushiki Kaisha Toshiba · 2005
- High throughput electron beam lithography system92US 6,014,200 ANikon Corporation · 2000
- Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput80US 5,369,282 AFujitsu Limited · 1994
- Pattern-definition device for maskless particle-beam exposure apparatus76US 7,084,411 B2IMS Nanofabrication GmbH · 2006
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991