Pattern-definition device for maskless particle-beam exposure apparatus

A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb) of electrically charged particles and allow the passage of the beam (pb) only through a plurality of apertures, comprising

• an aperture array means (203) having a plurality of apertures (21, 230) defining the shape of beamlets (bm) permeating said apertures and
• at least one deflector array means (501, 502, 503) separate from the aperture array means (203), said deflector array means (501, 502, 503) having a plurality of openings (250) surrounding the beamlets (bm), wherein for each opening or group of openings are provided at least two deflecting electrodes (ea1, ea2;
• eb1, eb2) to which different electrostatic potentials are applicable, thus correcting the path of the beamlet(s) passing through the respective opening according to a desired path through the device (102),
• wherein, according to a partition of the plurality of apertures (21, 230) into a set of subfields (Aij), the deflecting electrodes belonging to the same subfield (Aij) have common electric supplies.