G03F 7/075
Silicon-containing compounds
G03F7/075 (Silicon-containing compounds) appears on 2,138 US grants and 2,351 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,138
- Published applications
- 2,351
- Assignees
- 542
- Inventors
- 4,189
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 2 | 0 |
| 1978 | 5 | 0 |
| 1979 | 3 | 0 |
| 1980 | 4 | 0 |
| 1981 | 8 | 0 |
| 1982 | 7 | 0 |
| 1983 | 5 | 0 |
| 1984 | 12 | 0 |
| 1985 | 16 | 0 |
| 1986 | 16 | 0 |
| 1987 | 20 | 0 |
| 1988 | 25 | 0 |
| 1989 | 29 | 0 |
| 1990 | 17 | 0 |
| 1991 | 24 | 0 |
| 1992 | 29 | 0 |
| 1993 | 36 | 0 |
| 1994 | 30 | 0 |
| 1995 | 31 | 0 |
| 1996 | 18 | 0 |
| 1997 | 20 | 0 |
| 1998 | 22 | 0 |
| 1999 | 28 | 0 |
| 2000 | 42 | 0 |
| 2001 | 45 | 15 |
| 2002 | 40 | 66 |
| 2003 | 46 | 83 |
| 2004 | 56 | 89 |
| 2005 | 46 | 78 |
| 2006 | 52 | 65 |
| 2007 | 58 | 92 |
| 2008 | 45 | 86 |
| 2009 | 55 | 99 |
| 2010 | 51 | 94 |
| 2011 | 61 | 85 |
| 2012 | 60 | 76 |
| 2013 | 68 | 100 |
| 2014 | 102 | 103 |
| 2015 | 116 | 130 |
| 2016 | 103 | 98 |
| 2017 | 84 | 83 |
| 2018 | 72 | 104 |
| 2019 | 78 | 117 |
| 2020 | 73 | 113 |
| 2021 | 75 | 97 |
| 2022 | 72 | 99 |
| 2023 | 69 | 88 |
| 2024 | 65 | 110 |
| 2025 | 53 | 88 |
| 2026 | 39 | 93 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/0757Macromolecular compounds containing si-o, si-c or si-n bonds1,241
- G03F 7/0752In non photosensitive layers or as additives499
- G03F 7/0755Non-macromolecular compounds containing si-o, si-c or si-n bonds408
- G03F 7/0751Used as adhesion-promoting additives or as means to improve adhesion187
- G03F 7/0754Non-macromolecular compounds containing silicon-to-silicon bonds58
Recent patents
- Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method29 Sep 2026US 12,748,350 B2Shin-Etsu Chemical Co., Ltd.
- Hybrid method of forming microstructure array molds, methods of making microstructure arrays, and methods of use15 Sep 2026US 12,734,730 B2Panther Life Sciences Corporation
- Composition for forming organic film, patterning process, and compound and polymer for forming organic film8 Sep 2026US 12,730,377 B2Shin-Etsu Chemical Co., Ltd.
- Semiconductor photoresist composition and method of forming patterns using the composition25 Aug 2026US 12,717,228 B2Samsung SDI.Co., Ltd.
- Alkaline developer soluable silicon-containing resist underlayer film-forming composition25 Aug 2026US 12,717,235 B2Nissan Chemical Corporation
- Additives for organotin photoresist compositions and patterning of the same1 Oct 2026US 2026/0299407 A1
- Polysiloxane material and polysiloxane composition comprising the same24 Sep 2026US 2026/0288006 A1Merck Patent GmbH
- Negative type photosensitive composition17 Sep 2026US 2026/0277104 A1Merck Patent GmbH
- Silicone-containing copolymer, leveling agent, coating composition, resist composition, color filter, and method for producing silicone-containing copolymer10 Sep 2026US 2026/0265437 A1DIC Corporation
- Gas sensor10 Sep 2026US 2026/0266758 A1FaradaIC Sensors GmbH
Most cited
By later US patents
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004
- Photoresist polymer and photoresist composition containing the same471US 7,279,256 B2Hynix Semiconductor Inc. · 2007
- Radiation patternable CVD film460US 8,465,903 B2APPLIED Materials.Inc. · 2013
- Atomic layer deposition of photoresist materials and hard mask precursors382US 8,536,068 B2APPLIED Materials.Inc. · 2013