Additives for organotin photoresist compositions and patterning of the same

A solution comprising a blend of:

• an organic solvent,
• an organotin composition represented by the formula RSnL3, where R is an organyl group with from 1 to 31 carbon atoms and L is a hydrolysable ligand and
• one or more additive compositions represented by the chemical formula:
• X—RQ-Q, wherein:
• 1) Q is a low-polarity hydrocarbyl moiety with optional silicon atom substitution and with optional sulfur atom substitution having from 9 to 31 total carbon, silicon and sulfur atoms, RQ is an alkyl group with 1 to 8 carbon atoms or a silyl group, and X is H or a polar functional group comprising a heteroatom, or
• 2) Q is represented by the chemical formula —NR2R3, R2 and R3 are independently hydrogen or an alkyl group, X is H and RQ, R2, and R3 independently are H or an alkyl group and collectively have from 6 to 30 carbon atoms while forming an unhindered amine or
• 3) Q is represented by the chemical formula Ra—C≡C—, where Ra is a hydrogen or an alkyl group with 1 to 8 carbon atoms RQ is an alkyl group with 1 to 8 carbon atoms and X is an OH, or
• 4) Q is a hydrocarbyl group with one or more alkene groups, 2 to 31 carbon atoms and no heteroatoms, X is OH and RQ is an alkyl group having 1 to 8 carbon atoms, or
• 5) Q is represented by —R4NR5R6, RQ is an alkyl group with 1 to 8 carbon atoms or an aromatic group with 6 to 16 carbon atoms, and X is R3R2NR1—, where R1 is a bond or an alkyl group with 1 to 8 carbon atoms, R4 is a bond or an alkyl group with 1 to 8 carbon atoms, and R2, R3, R5, R6 are independently H or an alkyl group with 1 to 8 carbon atoms, and
• wherein the additive composition is present at a molar ratio relative to Sn from 0.01 to 10.