G03F 7/0754
Non-macromolecular compounds containing silicon-to-silicon bonds
Official title: {Non-macromolecular compounds containing silicon-to-silicon bonds (G03F7/0752 takes precedence)}
G03F7/0754 (Non-macromolecular compounds containing silicon-to-silicon bonds) appears on 58 US grants and 17 published applications in this corpus.
Search patents in G03F- Granted patents
- 58
- Published applications
- 17
- Assignees
- 29
- Inventors
- 150
- Latest grant
- 28 Mar 2017
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 4 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 5 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 3 |
| 2006 | 0 | 2 |
| 2007 | 2 | 0 |
| 2008 | 1 | 2 |
| 2009 | 1 | 2 |
| 2010 | 1 | 2 |
| 2011 | 1 | 2 |
| 2012 | 1 | 0 |
| 2013 | 2 | 0 |
| 2014 | 0 | 1 |
| 2015 | 1 | 0 |
| 2016 | 0 | 0 |
| 2017 | 1 | 1 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Photosensitive resin composition and application thereof28 Mar 2017US 9,606,436 B2Chi Mei Corporation
- Methods and devices for forming nanostructure monolayers and devices including such monolayers17 Mar 2015US 8,981,452 B2SanDisk Corporation
- Methods and devices for forming nanostructure monolayers and devices including such monolayers15 Oct 2013US 8,558,304 B2SanDisk Corporation
- Photoresist composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same16 Apr 2013US 8,420,296 B2Cheil Industries Inc.
- Resist sensitizer17 Apr 2012US 8,158,338 B2Massachusetts Institute of Technology
- Photosensitive surface treating agent, pattern formation substrate, laminate, transistor, pattern forming method and method of producing transistor12 Jun 2025US 2025/0189894 A1Nikon Corporation
- Photosensitive resin composition and application thereof23 Feb 2017US 2017/0052446 A1Chi Mei Corporation
- Methods and devices for forming nanostructure monolayers and devices including such monolayers6 Feb 2014US 2014/0035011 A1SanDisk Corporation
- Methods and Devices for Forming Nanostructure Monolayers and Devices Including Such Monolayers25 Aug 2011US 2011/0204432 A1Nanosys, Inc.
- Photoresist Composition for Color Filter Protective Layer, Color Filter Protective Layer Including the Same, and Image Sensor Including the Same30 Jun 2011US 2011/0160329 A1Cheil Industries Inc.
Most cited
By later US patents
- Method of forming a pattern using polysilane371US 6,025,117 AKabushiki Kaisha Toshiba · 2000
- Trilayer microlithographic process using a silicon-based resist as the middle layer144US 4,891,303 ATexas Instruments Incorporated · 1990
- Polysilanes, Polysiloxanes and silicone resist materials containing these compounds104US 4,822,716 AKabushiki Kaisha Toshiba · 1989
- Polysilanes, polysiloxanes and silicone resist materials containing these compounds79US 5,198,520 AKabushiki Kaisha Toshiba · 1993
- A silicone resist materials containing a polysiloxane and a photo-sensitive agent75US 5,017,453 AKabushiki Kaisha Toshiba · 1991