US 5,198,520 A · Polysilanes, polysiloxanes and silicone resist materials containing these compounds

Abstract

The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group. One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above. Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent. Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays. Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

Claims8

Dependent claims

An alkaline soluble polysilane that contains a structure shown by the formula ##STR55## wherein substituent groups R.sub.1 and to R.sub.3 may be identical or may be different, each representing a hydrogen atom, an alkyl group with with 1 to 10 carbon atoms, or a nonsubstituted or substituted aryl group with 6 to 14 carbon atoms,

the substituent group R.sub.4 represents an alkylene group with 1 to 10 carbon atoms or a nonsubstituted or substituted phenylene group with 6 to 14 carbon atoms,
and at least one of substituent groups R.sub.5 to R.sub.9 is a hydroxyl group, and the remaining groups other than the hydroxyl group among the substituent group R.sub.5 to R.sub.9 may be identical or may be different, each representing a hydrogen atom, a carboxyl group, alkoxy group with 1 to 10 carbon atoms, an alkyl group with 1 to 10 carbon atoms, or a nonsubstituted or substituted phenyl group with 6 to 14 carbon atoms,
and n and k represent positive integers and m represents zero or a positive integer.

A method of manufacturing a polysilane comprising a structure of the formula (I), ##STR56## wherein R.sub.1 through R.sub.3 are identical or different, each representing a hydrogen atoms, an alkyl group with 1 to 10 carbon atoms, or a nonsubstituted or substituted aryl group with 6 to 14 carbon atoms,

R.sub.4 represents an alkylene group with 1 to 10 carbon atoms or a nonsubstituted or substituted phenylene group with 6 to 14 carbon atoms,
and at least one of R.sub.5 through R.sub.9 is a hydroxyl group, and the remaining R.sub.5 through R.sub.9 other than the hydroxyl group is identical or different, each representing a hydrogen atom, a carboxyl group, alkoxy group with 1 to 10 carbon atoms, an alkyl group with 1 to 10 carbon atoms, or a nonsubstituted or substituted aryl group with 6 to 14 carbon atoms,
and n and k represent positive integers and m represents zero or a positive integer,
comprising reacting a first dichlorosilane of the formula, ##STR57## wherein R.sub.1 is as defined above, at least one of R.sub.55 through R.sub.59 is a trimethylsilylether group,
and the remaining R.sub.55 through R.sub.59 other than the trimethylsilylether group is identical or different, each representing a hydrogen atom, a carboxyl group, alkoxy group with 1 to 10 carbon atoms, an alkyl group with 1 to 10 carbon atoms, or a nonsubstituted or substituted aryl group with 6 to 14 carbon atoms,
or said first dichlorosilane and a second dichlorosilane of the formula
R.sub.2 R.sub.3 SiCl.sub.2
wherein R.sub.2 and R.sub.3 are as defined above,
with metallic sodium in the presence of xylene.

6 more elements

Dependencies are inferred from the claim text.

Polysilanes, polysiloxanes and silicone resist materials containing these compounds

Life of this patent

Polysilanes, polysiloxanes and silicone resist materials containing these compounds

Life of this patent

Abstract

Claims8